Gas supply device and gas supply method
AssigneeMitsubishi Heavy Industries, Ltd.
InventorKoki FUKUDA
Life of this patent
Estimating the term…
Abstract
A gas supply device of the disclosure includes: a liquefied gas vessel in which liquefied gas is stored; an injector configured to discharge the liquefied gas sucked from the liquefied gas vessel; a first liquefied gas supply path through which the liquefied gas is selectively allowed to flow from the liquefied gas vessel toward the injector; a gas supply path through which gas is selectively supplied to a gas utilization unit, the gas being obtained by vaporizing the liquefied gas flowing in from the injector during flowing through the gas supply path; and a drive fluid supply path through which the gas obtained in the gas supply path is selectively supplied as a drive fluid to the injector.
Claims19
A gas supply device comprising:
- a liquefied gas vessel in which liquefied gas is stored;
- an injector configured to discharge the liquefied gas sucked from the liquefied gas vessel;
- a first liquefied gas supply path through which the liquefied gas is selectively allowed to flow from the liquefied gas vessel toward the injector;
- a gas supply path through which gas is selectively supplied to a gas utilization unit, the gas being obtained by vaporizing the liquefied gas flowing in from the injector during flowing through the gas supply path;
- and
- a drive fluid supply path through which the gas obtained in the gas supply path is selectively supplied as a drive fluid to the injector.
A gas supply method comprising:
- allowing gas obtained by vaporizing liquefied gas to flow as a drive fluid and thereby drawing the liquefied gas from a liquefied gas supply source;
- and
- using the gas obtained by vaporizing the liquefied gas to be drawn as the drive fluid and supplying the gas to a gas utilization unit.
Dependencies are inferred from the claim text.