Substrate processing apparatus

An apparatus for processing a substrate, the apparatus comprising:

• a processing chamber for processing a substrate;
• and
• a treatment solution supply unit for supplying a treatment solution to the processing chamber,
• wherein the treatment solution supply unit includes:
• a first supply line for supplying deionized water;
• a second supply line for supplying ammonium hydroxide;
• a third supply line for supplying hydrogen peroxide solution;
• and
• a mixing manifold for producing the treatment solution by mixing the deionized water, the ammonium hydroxide, and the hydrogen peroxide solution;
• and
• a treatment solution supply line for supplying the treatment solution from the mixing manifold to the processing chamber, and
• the mixing manifold includes a body that has a buffer space therein and is formed with a first inlet flow path, a second inlet flow path, a third inlet flow path, and an outlet flow path,
• the first inlet flow path connects the first supply line and the buffer space,
• the second inlet flow path connects the second supply line and the buffer space,
• the third inlet flow path connects the third supply line and the buffer space,
• the outlet flow path connects the buffer space and the treatment solution supply line, and
• the first inlet flow path includes:
• a first inlet part through which the deionized water is introduced from the first supply line;
• and
• a first outlet part through which the deionized water flows out into the buffer space,
• the inlet unit, the second inlet flow path, and the third inlet flow path are formed in parallel with the outlet flow path, and
• the outlet part is formed to be inclined with respect to the outlet flow path.

An apparatus for processing a substrate, the apparatus comprising:

• a processing chamber for processing a substrate;
• a treatment solution supply unit for supplying a treatment solution to the processing chamber;
• and
• a controller,
• wherein the treatment solution supply unit includes:
• a first supply line through which a first liquid is supplied, and in which a first valve is installed to adjust a flow rate of the first liquid;
• a second supply line through which a second liquid is supplied, and in which a second valve is installed to adjust a flow rate of the second liquid;
• a third supply line through which a third liquid is supplied, and in which a third valve is installed to adjust a flow rate of the third liquid;
• a fourth supply line through which a fourth liquid is supplied, and in which a fourth valve is installed to adjust a flow rate of the fourth liquid;
• and
• a mixing manifold connected to the first to fourth supply lines,
• the mixing manifold includes a body having a space therein,
• the body includes:
• a first inlet flow path connected to the first supply line;
• a second inlet flow path connected to the second supply line;
• a third inlet flow path connected to the third supply line;
• a fourth inlet flow path connected to the fourth supply line;
• and
• an outlet flow path for supplying the treatment solution from the body to the processing chamber,
• the second inlet flow path and the third inlet flow path are formed in parallel with the outlet flow path,
• the first inlet flow path includes:
• a first inlet part through which the first liquid is introduced from the first supply line;
• and
• a first outlet part through which the first liquid flows out into the buffer space,
• the fourth inlet flow path includes:
• a second inlet part through which the second liquid is introduced from the first supply line;
• and
• a second outlet part through which the second liquid flows out into the buffer space,
• the first inlet part, the second inlet part, the second inlet flow path, and the third inlet flow path are formed in parallel with the outlet flow path,
• the first outlet part and the second outlet part are formed to be inclined toward the outlet line,
• the controller controls the first to fourth valves so that flow rates of the first liquid and the fourth liquid are greater than the second liquid and the third liquid,
• the first liquid is deionized water at a first temperature,
• the second liquid is ammonium hydroxide (NH4OH),
• the third liquid is hydrogen peroxide solution (H2O2), and
• the fourth liquid is deionized water at a second temperature.