Loading patent…
AssigneeFlowserve Management Company
InventorsRayk Hencke, Stefan Lähn, Julian Drechsel, Nils Meggers, Jochen Schreiner
Estimating the term…
The invention relates to a method for removing reactive particles from a vacuum environment (14), in which a process gas is conveyed from the vacuum environment (14) by means of a vacuum pump (21, 22). The process gas is passed between the vacuum environment (14) and the vacuum pump (21, 22) through a first filter (31) and a second filter (32) to filter reactive particles from the process gas. A liquid ring pump (35) is used to discharge particles from the first filter (31) and the second filter (32). In a first phase of the method, the first filter (31) is active and the second filter (32) is passive; in a second phase of the method, the first filter (31) is passive and the second filter (32) is active. In the first phase, the process gas is passed through the first filter (31) and the liquid ring pump (35) discharges particles from the second filter (32). In the second phase, the process gas is passed through the second filter (32) and the liquid ring pump (35) discharges particles from the first filter (31). The invention also relates to a device for removing reactive particles from a vacuum environment and to a process system for producing monocrystalline silicon ingots.
A method for removing reactive particles from a vacuum environment (14), the method comprising conveying a process gas from the vacuum environment (14) by means of a vacuum pump (21, 22), conducting the process gas between the vacuum environment (14) and the vacuum pump (21, 22) through a first filter (31) and a second filter (32) in order to filter reactive particles out of the process gas, and abstracting particles from the first filter (31) and the second filter (32) by means of a liquid-ring pump (35), wherein in a first phase of the method the first filter (31) is active and the second filter (32) is passive, wherein in a second phase of the method the first filter (31) is passive and the second filter (32) is active, wherein in the first phase the process gas is conducted through the first filter (31) and the liquid-ring pump (35) abstracts particles from the second filter (32), and wherein in the second phase the process gas is conducted through the second filter (32) and the liquid-ring pump (35) abstracts particles from the first filter (31).
An apparatus for removing reactive particles from a vacuum environment, comprising a vacuum housing (14) and comprising a vacuum pump (21, 22) connected to the vacuum housing (14), there being disposed between the vacuum housing (14) and the vacuum pump (21, 22) a first filter (31) and a second filter (32) for filtering reactive particles out of a process gas conveyed by means of the vacuum pump (21, 22), comprising a liquid-ring pump (35) for suctioning particles from the first filter (31) and the second filter (32), and comprising a switching device (57) for bringing the apparatus to a first switching state and a second switching state, such that in the first switching state the process gas is conducted through the first filter (31) and the liquid-ring pump (35) abstracts particles from the second filter (32) and such that in the second switching state the process gas is conducted through the second filter (32) and the liquid-ring pump (35) suctions particles from the first filter (31).
Dependencies are inferred from the claim text.