# US 2026/0076138 A1 · Substrate processing apparatus

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- Number: US 2026/0076138 A1
- Document ID: US20260076138A1
- Status: Published application
- Kind: A1
- Application number: 19/394,376
- Filed: 2025-11-19
- Published: 2026-03-12
- Earliest claimed: 2021-08-25
- Applicants: ASM IP Holding B.V.
- Inventors: SungHoon Jun; ByeongPil Park
- Web page: https://patentgrep.com/patent/US20260076138A1

## CPC

- H10P 72/0462: {characterised by the construction of the processing chambers, e.g. modular processing chambers}
- H10P 72/0402: {Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence)}
- H10P 72/0432: {mainly by conduction}
- H10P 72/7621: {characterised by supporting two or more semiconductor substrates}
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

A top lid capable of minimizing thermal deformation when a substrate processing temperature increases includes a support for supporting the top lid, the support protruding integrally from one surface of the top lid.

## Claims

### Claim 1

A top lid mounted on an upper end of a chamber of a substrate processing apparatus, the top lid comprising:
a support protruding integrally from one surface of the top lid,
wherein the top lid and the support are a single piece.

### Claim 2 (depends on 1)

The top lid of claim 1, wherein the top lid and the support include an identical material.

### Claim 3 (depends on 1)

The top lid of claim 1, wherein the top lid sags less when a substrate processing temperature increases than when the top lid and the support are of a detachable type.

### Claim 4 (depends on 1)

The top lid of claim 1, wherein the support is formed symmetrically with respect to a center of the top lid.

### Claim 5 (depends on 4)

The top lid of claim 4, wherein at least one of a height and a thickness of the support increases from an edge of the top lid toward the center of the top lid.

### Claim 6 (depends on 4)

The top lid of claim 4, wherein the support has a cross (+) shape.

### Claim 7 (depends on 6)

The top lid of claim 6, wherein
the support includes four arms, and
a central crossing portion of the support has a diameter greater than a width of the arms.

### Claim 8 (depends on 1)

The top lid of claim 1, further comprising:
one or more holes penetrating the top lid in a vertical direction, and
a step for supporting a gas supply unit at an inner edge of the one or more holes.

### Claim 9 (depends on 8)

The top lid of claim 8, the top lid further comprising one or more secondary holes configured to be connected to an exhaust unit.

### Claim 10 (depends on 1)

The top lid of claim 1, wherein the support does not have a groove for accommodating a connection device for fixing the support to the top lid.

### Claim 11 (depends on 1)

The top lid of claim 1, the support further comprising:
a horizontal extension portion extending along a first edge of the top lid; and
a vertical extension portion extending along a second edge of the top lid.

### Claim 12 (depends on 1)

The top lid of claim 1, wherein deformation of the top lid does not increase between 0 and 550° C.

### Claim 13

A substrate processing apparatus comprising:
a chamber having an inner space;
a top lid coupled to an upper end of the chamber;
at least one substrate support installed in the inner space of the chamber; and
one or more gas supply units configured to supply a process gas to a substrate,
wherein a support for supporting the top lid is formed to protrude from one surface of the top lid, the support comprising:
one or more holes penetrating the top lid in a vertical direction; and
a step formed at an inner edge of the one or more holes,
wherein each of the one or more gas supply units is seated on the step of one of the one or more holes,
wherein the top lid and the support are integrally formed as a single piece.

### Claim 14 (depends on 13)

The substrate processing apparatus of claim 13, wherein the top lid and the support include an identical material.

### Claim 15 (depends on 13)

The substrate processing apparatus of claim 13, wherein, in a case where a substrate processing temperature increases, a distance between the one or more gas supply units and the substrate support is maintained constant.

### Claim 16 (depends on 13)

The substrate processing apparatus of claim 13, wherein:
the support is formed to protrude from an upper surface of the top lid, and
an upper surface of the support is above an upper surface of the one or more gas supply units.

### Claim 17 (depends on 13)

The substrate processing apparatus of claim 13, wherein the top lid sags less when a substrate processing temperature increases than when the top lid and the support are of a detachable type.

### Claim 18 (depends on 13)

The substrate processing apparatus of claim 13, wherein the support supports the top lid uniformly along the support.

### Claim 19 (depends on 13)

The substrate processing apparatus of claim 13, the support further comprising:
a horizontal extension portion extending along a first edge of the top lid; and
a vertical extension portion extending along a second edge of the top lid.

### Claim 20 (depends on 13)

The substrate processing apparatus of claim 13, the top lid further comprising one or more secondary holes configured to be connected to an exhaust unit.