# US 2026/0074155 A1 · Plasma processing apparatus

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- Number: US 2026/0074155 A1
- Document ID: US20260074155A1
- Status: Published application
- Kind: A1
- Application number: 19/313,011
- Filed: 2025-08-28
- Published: 2026-03-12
- Earliest claimed: 2024-09-06
- Assignees: Panasonic Intellectual Property Management Co., Ltd.
- Applicants: Panasonic Intellectual Property Management Co., Ltd.
- Inventors: Naoaki TAKEDA; Satoru SUENAGA
- Web page: https://patentgrep.com/patent/US20260074155A1

## CPC

- H01J 37/32449: {Gas control, e.g. control of the gas flow}
- H01J 37/321: {the radio frequency energy being inductively coupled to the plasma}
- H01J 37/3211: {Antennas, e.g. particular shapes of coils}
- H05B 3/0019: {Circuit arrangements}
- H05B 3/28: heating conductor embedded in insulating material
- H01J 2237/334: Etching
- H05B 2203/007: using multiple electrically connected resistive elements or resistive zones
- H05B 2203/035: Electrical circuits used in resistive heating apparatus
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)
- H05B: ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL

## Abstract

A plasma processing apparatus includes a stage, a chamber, a dielectric member, an induction coil, an electric heater, and a power source section. The electric heater includes a first heater that heats a first region of the dielectric member, a second heater that heats a second region of the dielectric member, and a joint that connects these. A first resistor of the first heater extends in a specific direction from a first end to a second end along a first locus corresponding to the first region. A second resistor of the second heater extends in the specific direction from a third end to a fourth end along a second locus corresponding to the second region. The joint connects the first end and the third end. The power source section applies a voltage across the second end and the fourth end.

## Claims

### Claim 1

A plasma processing apparatus comprising:
a stage on which a target object is to be placed;
a chamber that houses the stage and that has an opening;
a dielectric member that closes the opening;
an induction coil that is provided on a side of the dielectric member opposite the stage and that generates plasma for processing the target object by application of high-frequency power;
an electric heater that is provided between the dielectric member and the induction coil and that heats the dielectric member; and
a power source section that applies a voltage to the electric heater,
wherein the dielectric member has a first region and a second region surrounding the first region,
the electric heater includes:
a first heater that heats the first region;
a second heater that heats the second region; and
a joint that connects the first heater and the second heater,
the first heater includes a first resistor having a first end and a second end,
the second heater includes a second resistor having a third end and a fourth end,
the first resistor extends in a specific direction from the first end to the second end along a first locus corresponding to the first region, the specific direction being one of circumferential directions,
the second resistor extends in the specific direction from the third end to the fourth end along a second locus corresponding to the second region,
the joint connects the first end and the third end, and
the power source section applies the voltage between the second end and the fourth end.

### Claim 2 (depends on 1)

The plasma processing apparatus according to claim 1,
wherein the dielectric member has an annular groove formed in a surface thereof facing the induction coil between first region and the second region.

### Claim 3 (depends on 2)

The plasma processing apparatus according to claim 2,
wherein at least a part of the induction coil is positioned in the annular groove.

### Claim 4 (depends on 1)

The plasma processing apparatus according to claim 1,
wherein the power source section is connected to the electric heater via a low-pass filter.

### Claim 5 (depends on 1)

The plasma processing apparatus according to claim 1,
wherein the joint extends in radial directions of the chamber.