# US 2026/0074151 A1 · Uniform pixelated microwave plasma source with substrate rotation > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2026/0074151 A1 - Document ID: US20260074151A1 - Status: Published application - Kind: A1 - Application number: 18/829,095 - Filed: 2024-09-09 - Published: 2026-03-12 - Earliest claimed: 2024-09-09 - Assignees: Applied Materials, Inc. - Applicants: Applied Materials, Inc. - Inventors: JOSEPH AUBUCHON; TZA-JING GUNG - Web page: https://patentgrep.com/patent/US20260074151A1 ## CPC - H01J 37/32247: {Resonators} - H01J 37/32192: {Microwave generated discharge (H01J37/32357, H01J37/32366, H01J37/32394, H01J37/32403 take precedence)} - H01J 37/32201: {Generating means} - H01J 37/32238: {Windows} - H01J 37/32715: {Workpiece holder} - H01J 2237/20214: Rotation - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract Embodiments described herein relate to an apparatus that includes a dielectric plate, and a plurality of dielectric resonators coupled to the dielectric plate. In an embodiment, the plurality of dielectric resonators are distributed across the dielectric plate in a pattern that is asymmetric in order to provide a plasma uniform flux density to an underlying substrate as the substrate is rotated. ## Claims ### Claim 1 An apparatus, comprising: a dielectric plate; and a plurality of dielectric resonators coupled to the dielectric plate, wherein the plurality of dielectric resonators are distributed across the dielectric plate in a pattern that is asymmetric. ### Claim 2 (depends on 1) The apparatus of claim 1, wherein each of the plurality of dielectric resonators comprise a pin inserted into a dielectric puck. ### Claim 3 (depends on 2) The apparatus of claim 2, wherein each of the plurality of dielectric resonators are electrically coupled to a different one of a plurality of microwave amplifiers, and wherein each of the plurality of microwave amplifiers are independently controllable. ### Claim 4 (depends on 1) The apparatus of claim 1, wherein the plurality of dielectric resonators comprises a first set of dielectric resonators and a second set of dielectric resonators, wherein the first set of dielectric resonators each have a center-point that is spaced from an origin of the dielectric plate by less than half of a radius of the dielectric plate and the second set of dielectric resonators have a center-point that is spaced from the origin of the dielectric plate by more than half of the radius of the dielectric plate. ### Claim 5 (depends on 4) The apparatus of claim 4, wherein the first set of dielectric resonators has a first number of dielectric resonators and the second set of dielectric resonators has a second number of dielectric resonators that is greater than the first number of dielectric resonators. ### Claim 6 (depends on 1) The apparatus of claim 1, wherein the plurality of dielectric resonators comprises four or more dielectric resonators. ### Claim 7 (depends on 1) The apparatus of claim 1, wherein the plurality of dielectric resonators are configured to ignite a plasma below the dielectric plate with a degree of uniformity that is at least 90% from a center to an edge of a substrate that is to be positioned below the dielectric plate. ### Claim 8 (depends on 7) The apparatus of claim 7, wherein the degree of uniformity is at least 97%. ### Claim 9 (depends on 1) The apparatus of claim 1, wherein the plurality of dielectric resonators are each positioned at different angles relative to a radius of the dielectric plate. ### Claim 10 (depends on 9) The apparatus of claim 9, wherein the plurality of dielectric resonators are each positioned at a different distance from an origin of the dielectric plate. ### Claim 11 (depends on 1) The apparatus of claim 1, wherein none of the plurality of dielectric resonators have a center point that is coincident with an origin of the dielectric plate. ### Claim 12 An apparatus, comprising: a chamber; a microwave plasma source coupled to the chamber, wherein the microwave plasma source comprises a plurality of dielectric resonators that are distributed over a dielectric plate, and wherein a pattern of the plurality of dielectric resonators does not include an axis of symmetry; and a pedestal within the chamber, wherein the pedestal is configured to be rotated. ### Claim 13 (depends on 12) The apparatus of claim 12, wherein the plurality of dielectric resonators are independently controllable. ### Claim 14 (depends on 12) The apparatus of claim 12, wherein the plurality of dielectric resonators comprises five or more dielectric resonators. ### Claim 15 (depends on 12) The apparatus of claim 12, wherein the plurality of dielectric resonators are configured to ignite a plasma within the chamber with a degree of uniformity that is at least 95% from a center to an edge of a substrate that is to be positioned on the pedestal. ### Claim 16 (depends on 12) The apparatus of claim 12, wherein the plurality of dielectric resonators are each positioned at different angles relative to a radius of the dielectric plate. ### Claim 17 (depends on 16) The apparatus of claim 16, wherein the plurality of dielectric resonators are each positioned at a different distance from an origin of the dielectric plate. ### Claim 18 A method, comprising: rotating a substrate on a pedestal within a chamber that comprises a microwave plasma source with a plurality of dielectric resonators that are distributed across the chamber in a pattern that does not have an axis of symmetry; and processing the substrate with a plasma induced by the plurality of dielectric resonators while the substrate is rotated. ### Claim 19 (depends on 18) The method of claim 18, wherein the plasma has a degree of uniformity is at least 95% from a center to an edge of a substrate. ### Claim 20 (depends on 18) The method of claim 18, wherein the substrate undergoes an integer number of full rotations during the processing.