Laser processing device, method, computer program product and workpiece

Laser processing device for processing a workpiece that is provided with a first pattern, the laser processing device comprising:

• a sensor device;
• a control device;
• and
• a laser device;
• wherein the sensor device is configured for sensing the first pattern and for providing hereupon sensor data from which a representative pattern is determinable that represents at least a part of the first pattern of the workpiece;
• wherein an ideal first pattern is associated with the first pattern of the workpiece;
• wherein the control device is configured for determining a mapping rule that defines a mapping of the ideal first pattern to the representative pattern;
• wherein the control device is configured for applying the mapping rule to an ideal second pattern to thereby generate processing data that represents a second pattern to be generated;
• wherein the control device is configured for controlling the laser device and thereby processing the workpiece according to the processing data.

Method for processing a workpiece that is provided with a first pattern, the method comprising:

• sensing the first pattern and providing hereupon sensor data from which a representative pattern is determinable that represents at least a part of the first pattern of the workpiece;
• determining a mapping rule that defines a mapping of an ideal first pattern to the representative pattern, wherein the ideal first pattern is associated with the first pattern of the workpiece;
• applying the mapping rule to an ideal second pattern to thereby generate processing data that represents a second pattern to be generated;
• processing the workpiece according to the processing data.