Plated member and manufacturing method thereof
AssigneeHitachi Astemo, Ltd.
InventorsAkihito HOSHINO, Yasuhisa OMATA, Hiroshi NAKANO
Life of this patent
Estimating the term…
Abstract
The present plated member includes, on an outer surface, a plated film mainly composed of chromium deposited from a trivalent chromium bath containing at least chromium, carbon, and oxygen, in which the plated film contains 60 to 80 at % of chromium and 16.5 to 30 at % of carbon and has an indentation hardness of 7 GPa or more on the outer surface, and a degree of crystallinity calculated from a peak integrated intensity ratio of a measured value of X-ray diffraction measurement and the following expression (1) is 4% or less.
Claims10
A plated member comprising, on an outer surface, a plated film mainly composed of chromium deposited from a trivalent chromium bath containing at least chromium, carbon, and oxygen, wherein
- the plated film contains 60 to 80 at % of chromium and 16.5 to 30 at % of carbon and has an indentation hardness of 7 GPa or more on the outer surface, and
- a degree of crystallinity calculated from a peak integrated intensity ratio of a measured value of X-ray diffraction measurement and the following expression (1) is 4% or less,
- Degree
-
- of
-
- crystallinity
-
- (
- peak
-
- integrated
-
- intensity
-
- ratio
- )
- =
-
-
- {
-
- (
- Crystalline
- )
- /
- (
- Crystalline
- +
- Amorphous
- )
- }
- ×
- 100
-
- %
- Expression
-
- (
- 1
- )
- Here, the indentation hardness indicates a value obtained by instrumented indentation hardness measurement using a nanoindentation method (ISO 14577), and the integrated intensity ratio in expression (1) indicates a value determined in an X-ray diffraction (XRD) analysis under conditions of 20:30° to 60°, a half width of crystalline:
- <3, and a half width of amorphous:
- ≥3.
A manufacturing method of a plated member, which is a manufacturing method of a plated member having a plated film formed by plating mainly composed of chromium deposited from a trivalent chromium bath, comprising a plating process of forming a plated film formed of a hard layer mainly composed of chromium deposited from a trivalent chromium bath on a surface of the plated member, wherein
- the plating process forms the plated film in a plating bath containing a trivalent chromium salt, a carboxylate, a pH buffer, and a conductivity salt at a bath temperature of 55 to 80° C. under conditions of a cathode current density of 45 to 100 A/dm2, and wherein
- the plated film is a plated film mainly composed of chromium deposited from a trivalent chromium bath containing at least chromium, carbon, and oxygen, and
- the plated film contains 60 to 80 at % of chromium and 16.5 to 30 at % of carbon and has an indentation hardness of 7 GPa or more on an outer surface,
- Here, the indentation hardness indicates a value obtained by instrumented indentation hardness measurement conducted using a nanoindentation method (ISO 14577).
(canceled)
A manufacturing method of a plated member, which is a manufacturing method of a plated member having a plated film formed by plating mainly composed of chromium deposited from a trivalent chromium bath, comprising a plating process of forming a plated film formed of a hard layer mainly composed of chromium deposited from a trivalent chromium bath on a surface of the plated member, wherein
- the plating process forms the plated film in a plating bath containing a trivalent chromium salt, a carboxylate, a pH buffer, and a conductivity salt at a bath temperature of 55 to 80° C. under conditions of a cathode current density of 45 to 100 A/dm2, and wherein
- the plated film does not have diffraction spots at positions corresponding to an inter-lattice plane distance d value of 2.0 to 2.2 Å in a film inspection using electron beam diffraction.
Dependencies are inferred from the claim text.