Electroless plating solution
AssigneeNapra Co., Ltd.
InventorShigenobu SEKINE
Life of this patent
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Abstract
According to this invention, disclosed is an electroless plating solution containing a metal ion source having a parent phase that contains Sn and a Sn-Cu alloy, and an intermetallic compound crystal that contains Sn, Cu, Cr and Al, dispersed in the parent phase.
Claims2
An electroless plating solution containing a metal ion source having a parent phase that contains Sn and a Sn-Cu alloy, and an intermetallic compound crystal that contains Sn, Cu, Cr and Al, dispersed in the parent phase,
- the parent phase in the metal ion source having a composition represented by:
- Cu:
- 5 to 0.02% by mass;
- Cr:
- 0.001 to 18% by mass;
- Al:
- 3 to 0.02% by mass;
- and
- the balance of Sn,
- the intermetallic compound crystal having a composition represented by:
- Cu:
- 5 to 50% by mass;
- Cr:
- 0.001 to 10% by mass;
- Al:
- 0.1 to 20% by mass;
- and
- the balance of Sn,
- and a proportion of the intermetallic compound crystal being 20 to 60% by mass.
An electroless plating solution containing a metal ion source having a parent phase that contains Sn and a Sn-Cu alloy, and an intermetallic compound crystal that contains Sn, Cu, Cr, Al and Ni, dispersed in the parent phase,
- the parent phase in the metal ion source having a composition represented by:
- Cu:
- 5 to 0.02% by mass;
- Cr:
- 0.001 to 18% by mass;
- Al:
- 3 to 0.02% by mass;
- Ni:
- 1 to 0.02% by mass;
- and
- the balance of Sn,
- the intermetallic compound crystal having a composition represented by:
- Cu:
- 5 to 50% by mass;
- Cr:
- 0.001 to 18% by mass;
- Al:
- 0.1 to 20% by mass;
- Ni:
- 0.1 to 6.5% by mass;
- and
- the balance of Sn,
- and proportion of the intermetallic compound crystal being 20 to 60% by mass.
Dependencies are inferred from the claim text.