Particle accelerator having configurable quadrupole assembly
AssigneeApplied Materials, Inc.
InventorsWai Ming Tam, William Herron Park, JR., Scott E. Peitzsch
Life of this patent
Estimating the term…
Loading patent…
AssigneeApplied Materials, Inc.
InventorsWai Ming Tam, William Herron Park, JR., Scott E. Peitzsch
Estimating the term…
An ion implanter. The ion implanter may include an ion source, to generate a continuous ion beam. The ion implanter may further include a linear accelerator, comprising a buncher, to receive the continuous ion beam and generate a bunched ion beam, and further comprising a plurality of acceleration stages, arranged to receive the bunched ion beam and accelerate the bunched ion beam. The ion implanter may also include a plurality of quadrupoles, arranged in alternating fashion with the plurality of acceleration stages; and a plurality of quadrupole switch assemblies, coupled to the plurality of plurality of quadrupoles, respectively, wherein a given quadrupole switch assembly comprises a polarity switching circuit.
An ion implanter, comprising:
A control arrangement for operating a linear accelerator, comprising:
A method of operating an ion implanter, comprising:
Dependencies are inferred from the claim text.