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US 2026/0068022 A1Published application
System and methods for shear flow control of frc plasma
AssigneeTae Technologies, Inc.
InventorsToshiki Tajima, Hiroshi Gota
Life of this patent
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Abstract
A high performance field reversed configuration (FRC) system includes a central confinement chamber, two diametrically opposed compact toroid plasma injectors coupled to the chamber, two divertor chambers interposing the injectors and the chamber, and opposing sets of biasing electrodes. A magnetic system includes quasi-dc coils axially positioned along the FRC system components.
Claims21
A method for maintaining a magnetically confined field reversed configuration (FRC) plasma comprising the steps of:
- injecting beams of fast neutral atoms from neutral beam injectors into the FRC plasma at an angle towards the mid-plane of the confinement chamber, and
- controlling the radial electric field profile in an edge layer of the FRC plasma by applying a distribution of electric potential to a group of open flux surfaces of the FRC with opposing sets of biasing electrodes, wherein each set of biasing electrodes includes a plurality of mutually insulated electrodes.
21-33. (canceled)
Dependencies are inferred from the claim text.