# US 2026/0064005 A1 · Extreme ultraviolet (euv) radiation source apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2026/0064005 A1 - Document ID: US20260064005A1 - Status: Published application - Kind: A1 - Application number: 19/378,377 - Filed: 2025-11-04 - Published: 2026-03-05 - Earliest claimed: 2023-05-04 - Assignees: Taiwan Semiconductor Manufacturing Company, Ltd. - Applicants: Taiwan Semiconductor Manufacturing Company Ltd. - Inventors: HSIN-FU TSENG; CHIH-CHIANG TU; CHIH-WEI WEN; CHIEN-HSING LU; TZU JENG HSU - Web page: https://patentgrep.com/patent/US20260064005A1 ## CPC - G03F 7/70033: {by plasma extreme ultraviolet [EUV] sources} - G03F 7/70916: {Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps} - H05G 2/008: {involving an energy-carrying beam in the process of plasma generation} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - H05G: X-RAY TECHNIQUE (investigating or analysing materials by the use of X-rays G01N23/00; apparatus for X-ray photography G03B42/02; X-ray tubes H01J35/00; TV systems having X-ray input H04N5/321) ## Abstract An EUV radiation source apparatus includes an EUV source vessel including a chamber, a crucible disposed in the chamber, a catcher disposed in the chamber, a first channel, a second channel, and a first opening formed on the first channel. The catcher includes a first aperture and a second aperture separated from each other. The first channel is adjacent to the first aperture, and the second channel is adjacent to the second aperture. The first channel is configured to introduce a laser beam into the chamber, the second channel is configured to allow EUV radiation to exit the chamber, and the first opening is configured to dissipate heat or gas from the first channel. ## Claims ### Claim 1 An extreme ultraviolet (EUV) radiation source apparatus, comprising: an EUV source vessel including a chamber; a crucible disposed in the chamber; a catcher disposed in the chamber, wherein the catcher has a first aperture and a second aperture separated from each other; a first channel adjacent to the first aperture, and configured to introduce a laser beam into the chamber; a second channel adjacent to the second aperture, and configured to allow EUV radiation to exit the chamber; and a first opening formed on the first channel and configured to dissipate heat or gas from the first channel. ### Claim 2 (depends on 1) The EUV radiation source apparatus of claim 1, wherein the first channel comprises a first segment disposed outside the chamber and a second segment disposed within the chamber. ### Claim 3 (depends on 2) The EUV radiation source apparatus of claim 2, wherein the first opening is formed on the first segment of the first channel. ### Claim 4 (depends on 2) The EUV radiation source apparatus of claim 2, wherein the first opening is formed on the second segment of the first channel. ### Claim 5 (depends on 1) The EUV radiation source apparatus of claim 1, further comprising a second opening formed on the second channel, and configured to dissipate heat or gas from the second channel. ### Claim 6 (depends on 5) The EUV radiation source apparatus of claim 5, wherein a distance between the first opening and the catcher is less than a distance between the second opening and the catcher. ### Claim 7 An extreme ultraviolet (EUV) radiation source apparatus, comprising: an EUV source vessel including a chamber; a crucible disposed in the chamber; a catcher disposed in the chamber, wherein the catcher has a first aperture and a second aperture separated from each other; a first channel adjacent to the first aperture, and configured to introduce a laser beam into the chamber; a second channel adjacent to the second aperture, and configured to allow EUV radiation to exit the chamber; and a first opening formed on the second channel and configured to dissipate heat or gas from the second channel. ### Claim 8 (depends on 7) The EUV radiation source apparatus of claim 7, wherein the second channel comprises a first segment disposed outside the chamber and a second segment disposed within the chamber. ### Claim 9 (depends on 8) The EUV radiation source apparatus of claim 8, wherein the first opening is formed on the first segment of the second channel. ### Claim 10 (depends on 7) The EUV radiation source apparatus of claim 7, further comprising a second opening formed on the first channel, and configured to dissipate heat or gas from the first channel. ### Claim 11 (depends on 10) The EUV radiation source apparatus of claim 10, wherein a distance between the first opening and the catcher is greater than a distance between the second opening and the catcher. ### Claim 12 (depends on 10) The EUV radiation source apparatus of claim 10, wherein the first channel comprises a first segment disposed outside the chamber and a second segment disposed within the chamber, and the second opening is disposed on the first segment. ### Claim 13 (depends on 10) The EUV radiation source apparatus of claim 10, wherein the first channel comprises a first segment disposed outside the chamber and a second segment disposed within the chamber, and the second opening is disposed on the second segment. ### Claim 14 An extreme ultraviolet (EUV) radiation source apparatus, comprising: an EUV source vessel including a chamber; a crucible disposed in the chamber; a catcher disposed in the chamber, wherein the catcher has a first aperture and a second aperture separated from each other; a first channel adjacent to the first aperture, and configured to introduce a laser beam into the chamber; a second channel adjacent to the second aperture, and configured to allow EUV radiation to exit the chamber; a first opening formed on the EUV source vessel; a second opening formed on the first channel; and a third opening formed on the second channel, wherein first opening, the second opening and the third opening are configured to dissipate heat or gas from the chamber. ### Claim 15 (depends on 14) The EUV radiation source apparatus of claim 14, wherein a distance between the second opening and the catcher is less than a distance between the third opening and the catcher. ### Claim 16 (depends on 14) The EUV radiation source apparatus of claim 14, further comprising a heat dissipation structure disposed over the catcher. ### Claim 17 (depends on 14) The EUV radiation source apparatus of claim 14, wherein the first channel comprises a first segment disposed outside the chamber and a second segment disposed within the chamber, and the second opening is disposed on the first segment or the second segment. ### Claim 18 (depends on 14) The EUV radiation source apparatus of claim 14, wherein the second channel comprises a first segment disposed outside the chamber and a second segment disposed within the chamber, and the third opening is disposed on the first segment of the second channel. ### Claim 19 (depends on 14) The EUV radiation source apparatus of claim 14, wherein the laser beam is provided into the EUV radiation source apparatus in a first direction, and the EUV radiation exits the EUV radiation source apparatus in a second direction different from the first direction. ### Claim 20 (depends on 19) The EUV radiation source apparatus of claim 19, wherein the first direction and the second direction form an acute angle.