Resist composition, laminate, and patterning process

A resist composition comprising a hypervalent iodine compound represented by the following formula (1), a carboxy group-containing compound, and a solvent,

• wherein “m” represents an integer of 0 to 2;
• “n” represents an integer of 0 to 4 when “m” is 0, an integer of 0 to 6 when “m” is 1, and an integer of 0 to 8 when “m” is 2;
• R1, R2, and R3 represent each independently a halogen atom or a hydrocarbyl group having 1 to 10 carbon atoms and optionally having a heteroatom, and R1, R2, and R3 may be bonded to each other to form a ring;
• R4 represents a halogen atom or a hydrocarbyl group having 1 to 40 carbon atoms and optionally having a heteroatom, R4s may be identical to or different from each other when “n” is 2 or greater, and a plurality of R4s may be bonded to each other to form a ring together with the carbon atoms of the aromatic ring bonded thereto;
• R5 represents a carbonyl group or a hydrocarbylene group having 1 to 10 carbon atoms and optionally having a heteroatom;
• and *1 and *2 represent an attachment point to a carbon atom of the aromatic ring in the formula, and *1 and *2 are bonded to adjacent carbon atoms of the aromatic ring.