# US 2026/0062829 A1 · Plating apparatus and plating method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2026/0062829 A1 - Document ID: US20260062829A1 - Status: Published application - Kind: A1 - Application number: 19/384,632 - Filed: 2025-11-10 - Published: 2026-03-05 - Earliest claimed: 2023-07-31 - Assignees: ACM Research (Shanghai) Inc. - Applicants: ACM Research (Shanghai) Inc. - Inventors: Yinuo Jin; Hongchao Yang; Jian Wang; Hui Wang - Web page: https://patentgrep.com/patent/US20260062829A1 ## CPC - C25D 5/18: Electroplating using modulated, pulsed or reversing current - C25D 5/08: Electroplating with moving electrolyte e.g. jet electroplating {(using locally applied jets of electrolyte C25D5/026)} - C25D 7/123: {Semiconductors first coated with a seed layer or a conductive layer} - C25D 17/001: {Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells} - C25D 17/002: {Cell separation, e.g. membranes, diaphragms} - C25D 17/004: {Sealing devices} - C25D 17/02: Tanks; Installations therefor - C25D 17/12: Shape or form (C25D17/14 takes precedence) - C25D 21/12: Process control or regulation (controlling or regulating in general G05) - H10P 14/47: Electrolytic deposition, i.e. electroplating; Electroless plating - H10W 20/041: {the barrier, adhesion or liner layers being discontinuous} - H10W 20/043: {for electroplating} - Y02P 10/20: Recycling - C25D: PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 - H10W: GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10 - Y02P: CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS ## Abstract The present invention discloses a plating apparatus and plating methods for plating metal layers on a substrate. In an embodiment, a plating method comprises: step 1: immersing a substrate into plating solution of a plating chamber assembly including at least a first anode and a second anode; step 2: turning on a first plating power supply applied on the first anode, setting the first plating power supply to output a power value P11 and continue with a period T11; step 3: when the period Tn ends, adjusting the first plating power supply applied on the first anode to output a power value P12 and continue with a period T12, at the same time, turning on a second plating power supply applied on the second anode, and setting the second plating power supply to output a power value P21 and continue with a period T21; and step 4: when the period T21 ends, adjusting the second plating power supply applied on the second anode to output a power value P22 and continue with a period T22, wherein step 2 to step 4 are performed periodically. ## Claims ### Claim 1 A plating apparatus for plating metal layers on a substrate, comprising: a plating chamber assembly, further comprising: an anode chamber, being divided into multiple independent anode zones, every independent anode zone accommodating an anode powered by a plating power supply and having an independent anolyte inlet, an independent anolyte outlet and an independent vent drain outlet; a membrane frame, being fixed on the top of the anode chamber, the membrane frame having a base portion, the top of the base portion extending upward to form a side wall, the base portion and the side wall forming a cathode chamber, a plurality of first separating walls being disposed on the top of the base portion to divide the cathode chamber into multiple cathode zones, the base portion having a plurality of pairs of branch pipes for supplying plating solution to the cathode zones, each branch pipe having a plurality of supply holes; and a membrane, being attached on the bottom of the base portion of the membrane frame to separate the anode chamber and the cathode chamber. ### Claim 2 (depends on 1) The plating apparatus according to claim 1, further comprising a diffusion plate being fixed in the cathode chamber, the diffusion plate having a mass of holes, the bottom surface of the diffusion plate defining a plurality of lower inserting slots, the plurality of first separating walls of the membrane frame respectively being inserted in the lower inserting slots. ### Claim 3 (depends on 2) The plating apparatus according to claim 2, further comprising a plurality of second separating walls being fixed on the top surface of the diffusion plate. ### Claim 4 (depends on 3) The plating apparatus according to claim 3, wherein the top structure shape of the second separating walls are rectangle, triangle, or arc. ### Claim 5 (depends on 3) The plating apparatus according to claim 3, further comprising a third separating wall being fixed on the top surface of the diffusion plate, the third separating wall being set between the side wall of the membrane frame and the outermost second separating wall, the third separating wall being lower than the second separating walls. ### Claim 6 (depends on 2) The plating apparatus according to claim 2, wherein the inner surface of the side wall of the membrane frame defines a clamp slot, a plurality of fixing members is configured to fix the diffusion plate in the cathode chamber, every fixing member has a fixing plate and an inserting plate protruding from a side wall of the fixing plate, the inserting plate is inserted in the clamp slot of the membrane frame and a fixing screw is configured to fix the fixing plate and the edge of the diffusion plate. ### Claim 7 (depends on 1) The plating apparatus according to claim 1, wherein every two adjacent anode zones are separated by a vertically arranged partition, a plurality of pairs of seal rings are configured to separate the anode zones to form completely independent anode zones. ### Claim 8 (depends on 1) The plating apparatus according to claim 1, wherein each vent drain outlet connects to a vent drain passage, the vent drain passage is set in each anode zone, and the vent drain passage has a top end which is located at the highest point of the anode zone. ### Claim 9 (depends on 8) The plating apparatus according to claim 8, wherein the top end of each vent drain passage has a first surface and a second surface connecting to the first surface and aslant downward extending, the first surface of the top end of the vent drain passage abuts against the membrane and a vent drain inlet is formed between the membrane and the second surface of the top end of the vent drain passage. ### Claim 10 (depends on 1) The plating apparatus according to claim 1, wherein the bottom of the base portion of the membrane frame is obliquely upward, or substantially V-shaped, or substantially inverted V-shaped. ### Claim 11 (depends on 1) The plating apparatus according to claim 1, wherein every anode zone further accommodates a conductive plate and a conductive connecting member, the connecting member has a horizontal portion and a vertical portion, the conductive plate is located underneath the anode, the horizontal portion of the connecting member is set underneath the conductive plate and the vertical portion of the connecting member passes through a through-hole defined at the bottom of the anode zone for connecting to a controlled plating power supply. ### Claim 12 (depends on 11) The plating apparatus according to claim 11, wherein every connecting member is connected to an independent plating power supply, or all the connecting members are connected to a controlled plating power supply and the plating power supply is capable of switching over among the anodes for implementing partial plating. ### Claim 13 (depends on 11) The plating apparatus according to claim 11, further comprising an outer seal ring and an inner seal ring, being respectively set between the horizontal portion of the connecting member and the bottom of the anode zone, the bottom of the anode zone further defining a deionized water trough between the outer seal ring and the inner seal ring, the deionized water trough containing deionized water. ### Claim 14 (depends on 1) The plating apparatus according to claim 1, wherein the plurality of supply holes on each branch pipe are divided into multiple groups and each group of supply holes is corresponding to one cathode zone. ### Claim 15 (depends on 14) The plating apparatus according to claim 14, wherein the density of the supply holes corresponding to every cathode zone is same, and the diameter of the supply holes gradually increases from the center of the cathode chamber to the edge of the cathode chamber, or the diameter of the supply holes corresponding to every cathode zone is same, and the density of the supply holes gradually increases from the center of the cathode chamber to the edge of the cathode chamber. ### Claim 16 (depends on 1) The plating apparatus according to claim 1, wherein every two opposite branch pipes having a plurality of supply holes form a pair of branch pipes for supplying plating solution to one cathode zone, the supply holes of every pair of branch pipes are only corresponding to one cathode zone. ### Claim 17 (depends on 1) The plating apparatus according to claim 1, further comprising a peripheral chamber encircling the anode chamber and the cathode chamber, the peripheral chamber having a plurality of catholyte outlets which are distributed at the bottom of the peripheral chamber. ### Claim 18 (depends on 17) The plating apparatus according to claim 17, further comprising a shroud being positioned on the top of the peripheral chamber. ### Claim 19 (depends on 1) The plating apparatus according to claim 1, further comprising at least one substrate rinse nozzle being configured to clean plated film on the substrate after the substrate has been plated. ### Claim 20 (depends on 1) The plating apparatus according to claim 1, wherein during the substrate plating process, the center of the substrate has misalignment with the center of the cathode chamber. ### Claim 21 (depends on 1) The plating apparatus according to claim 1, further comprising a center cap and an adjustable member, being disposed at the center of the membrane frame for improving the uniformity of plating solution flow and electric field at the substrate center range.