Negative resist composition, and method for producing resist pattern

A negative resist composition comprising a resin (A1) including a structural unit represented by formula (a2-1) and a structural unit represented by formula (a2-4), a novolak resin (A2), a resin (A3) including a structural unit represented by formula (a3-1) and a structural unit represented by formula (a3-2), a crosslinking agent (E) and an acid generator (B):

• wherein, in formula (a2-1) and formula (a2-4),
• Ra7 and Ra13 each independently represent a hydrogen atom or a methyl group,
• Ra10 and Ra14 each independently represent an alkyl group having 1 to 6 carbon atoms,
• Ra15 represents a hydrocarbon group having 1 to 12 carbon atoms, and a methylene group included in the hydrocarbon group may be replaced by an oxygen atom or a carbonyl group,
• m1 represents an integer of 0 to 4, and when m1 is 2 or more, a plurality of Ra10 may be the same or different from each other,
• m2 represents an integer of 1 to 4,
• in which the total of m1 and m2 is 5 or less,
• m3 represents an integer of 0 to 4, and when m3 is 2 or more, a plurality of Ra14 may be the same or different from each other, and
• m4 represents an integer of 1 to 4, and when m4 is 2 or more, a plurality of Ra15 may be the same or different from each other,
• in which the total of m3 and m4 is 5 or less, and:
• wherein, in formula (a3-1) and formula (a3-2),
• Ra31 and Ra32 each independently represent a hydrogen atom or a methyl group, and
• Ra33 represents an alkyl group having 1 to 12 carbon atoms, and a methylene group included in the alkyl group may be replaced by an oxygen atom.