Resist composition, resist pattern forming method, compound, and intermediate thereof
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsHiroki KATO, Takuya UEHARA
Life of this patent
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Abstract
A resist composition including a base material component and a compound represented by General Formula (d0) in which Mm+ represents an m-valent organic cation, m represents an integer of 1 or greater, Yd0 represents a divalent linking group, and Rpg represents an acid dissociable group represented by General Formula (a0-pg). In Formula (a0-pg), A represents a cyclic alkene having only one carbon-carbon unsaturated bond in a ring skeleton, Ra01 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms, I represents an iodine atom, m1 represents an integer of 0 to 20, m2 represents an integer of 1 to 20, and * represents a bonding site that is bonded to —O— (oxy group) in -Yd0-CO—O—.
Claims20
A resist composition which generates an acid upon light exposure and whose solubility in a developing solution is changed by an action of the acid, the resist composition comprising:
- a base material component (A) whose solubility in a developing solution is changed by the action of the acid;
- and
- a compound (D0) represented by General Formula (d0),
- wherein Mm+ represents an m-valent organic cation, m represents an integer of 1 or greater, Yd0 represents a divalent linking group, and Rpg represents an acid dissociable group represented by General Formula (a0-pg),
- wherein A represents a cyclic alkene having only one carbon-carbon unsaturated bond in a ring skeleton, Ra01 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms, I represents an iodine atom, m1 represents an integer of 0 to 20, m2 represents an integer of 1 to 20, where m1+m2≤(a total number of carbon atoms constituting the ring skeleton of the cyclic alkene as A−1) is satisfied, in a case where m1 represents an integer of 2 or greater, a plurality of Ra01's may be the same as or different from each other, and * represents a bonding site that is bonded to —O— (oxy group) in -Yd0-CO—O—.
A compound which is represented by General Formula (d0),
- wherein in Formula (d0), Mm+ represents an m-valent organic cation, m represents an integer of 1 or greater, Yd0 represents a divalent linking group, and Rpg represents an acid dissociable group represented by General Formula (a0-pg),
- wherein in Formula (a0-pg), A represents a cyclic alkene having only one carbon-carbon unsaturated bond in a ring skeleton, Ra01 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms, I represents an iodine atom, m1 represents an integer of 0 to 20, m2 represents an integer of 1 to 20, where m1+m2≤(a total number of carbon atoms constituting the ring skeleton of the cyclic alkene as A−1) is satisfied, in a case where m1 represents an integer of 2 or greater, a plurality of Ra01's may be the same as or different from each other, and * represents a bonding site that is bonded to —O— (oxy group) in -Yd0-CO—O—.
A compound which is represented by General Formula (d0-p),
- wherein in Formula (d0-p), Mpm′+ represents an organic cation or a metal cation, m′ represents an integer of 1 or greater, Yd0 represents a divalent linking group, and Rpg represents an acid dissociable group represented by General Formula (a0-pg),
- wherein in Formula (a0-pg), A represents a cyclic alkene having only one carbon-carbon unsaturated bond in a ring skeleton, Ra01 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms, I represents an iodine atom, m1 represents an integer of 0 to 20, m2 represents an integer of 1 to 20, where m1+m2≤(a total number of carbon atoms constituting the ring skeleton of the cyclic alkene as A−1) is satisfied, in a case where m1 represents an integer of 2 or greater, a plurality of Ra01's may be the same as or different from each other, and * represents a bonding site that is bonded to —O— (oxy group) in -Yd0-CO—O—.
Dependencies are inferred from the claim text.