Photonic structure and method for manufacturing the same
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsMING YANG JUNG, STEFAN RUSU, CHENG-TSE TANG
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Abstract
A photonic structure and a method for manufacturing the same are provided. The photonic structure includes a substrate, an insulating structure, a first waveguide layer, a second waveguide layer and a high-dielectric constant material. The insulating structure is located over the substrate. The first waveguide layer is embedded in the insulating structure. The second waveguide layer is embedded in the insulating structure and longitudinally spaced apart from the first waveguide layer. The high-dielectric constant material is disposed between the first waveguide layer and the second waveguide layer.
Claims20
A photonic structure, comprising:
- a substrate;
- a first waveguide layer over the substrate along a first direction;
- a second waveguide layer spaced apart from the first waveguide layer along the first direction;
- and
- a coupling material disposed between the first waveguide layer and the second waveguide layer and configured to transfer light between the first waveguide layer and the second waveguide layer;
- and
- an insulating layer surrounding the coupling material along a second direction different from the first direction,
- wherein a dielectric constant of the coupling material is greater than a dielectric constant of the insulating layer,
- and the coupling material has a first portion overlapping the first waveguide layer along the first direction and a second portion free from overlapping the first waveguide layer along the first direction.
A photonic structure, comprising:
- a substrate;
- a first waveguide layer overlapping the substrate along a first direction;
- a second waveguide layer overlapping the substrate along the first direction;
- a coupling material disposed between the first waveguide layer and the second waveguide layer along the first direction;
- an insulating layer overlapping the coupling material along a second direction different from the first direction,
- wherein a dielectric constant of the coupling material is greater than a dielectric constant of the insulating layer, and wherein the first waveguide layer has a surface area less than a surface area of the coupling material in a top view.
A method for manufacturing a photonic structure, comprising:
- providing a substrate;
- forming a first waveguide layer over the substrate along a first direction;
- forming a coupling material over the first waveguide layer along the first direction, wherein the coupling material has a first portion overlapping the first waveguide layer along the first direction and a second portion free from overlapping the first waveguide layer along the first direction;
- forming an insulating layer surrounding the coupling material along a second direction different from the first direction;
- and
- forming a second waveguide layer over the coupling material along the first direction.
Dependencies are inferred from the claim text.