Substrate polishing device

A substrate polishing device for polishing a substrate using a magnetorheological fluid (MRF), the substrate polishing device comprising:

• a plurality of wheels in at least a 2×2 matrix and configured to rotate based on a wheel axis that is parallel to the substrate,, the plurality of wheels comprising electromagnets;
• at least two belts, each of the at least two belts comprising a first surface on a circumference of the plurality of wheels arranged in a row and a second surface opposite to the first surface and facing a polishing surface of the substrate, the at least two belts being configured to support the MRF and move based on to rotation of the plurality of wheels;
• a head structure configured to support the substrate such that the polishing surface of the substrate faces the second surface of each belt of the at least two belts;
• a magnetic field supplier configured to supply current to the electromagnets to generate a magnetic field in the plurality of wheels;
• an MRF supplier configured to supply the MRF to the second surface of each belt of the at least two belts;
• a recovery structure configured to recover the MRF from the second surface of each belt of the at least two belts;
• and
• a conditioner on the magnetic field supplier and configured to maintain the MRF recovered from the recovery structure and supplied to the MRF supplier at a preset constant condition.

A substrate polishing device for polishing a substrate using a magnetorheological fluid (MRF), the substrate polishing device comprising:

• a plurality of wheels arranged in a row and configured to rotate based on a wheel axis parallel to the substrate, the plurality of wheels comprising an electromagnet;
• a belt comprising a first surface on a circumference of the plurality of wheels and a second surface opposite to the first surface and facing a polishing surface of the substrate, the belt being configured to support the MRF and move based on to rotation of the plurality of wheels;
• a magnetic field supplier on a side of the plurality of wheels and configured to supply current to the electromagnet to generate a magnetic field in the plurality of wheels;
• an MRF supplier configured to supply the MRF to the second surface of the belt;
• a recovery structure configured to recover the MRF from the belt;
• and
• a conditioner on a side portion of the magnetic field supplier and configured to maintain the MRF recovered from the recovery structure and supplied to the MRF supplier under a preset constant condition,
• wherein the belt passes through a center of the polishing surface of the substrate.