Back to results
US 2026/0044082 A1Published application
Resist underlayer film-forming composition
AssigneeNissan Chemical Corporation
InventorsKosuke IGATA, Hiroto OGATA, Tomotada HIROHARA
Life of this patent
Estimating the term…
Abstract
A resist underlayer film-forming composition includes: a polymer; and a solvent, in which the polymer has, in a side chain, one or two or more polymerizable multiple bonds selected from the group consisting of a carbon-carbon double bond, a carbon-carbon triple bond, a carbon-nitrogen double bond, and a carbon-nitrogen triple bond.
Claims11
A resist underlayer film-forming composition comprising:
- a polymer (A);
- and a solvent, wherein the polymer (A) has, in a side chain, one or two or more polymerizable multiple bonds selected from the group consisting of a carbon-carbon double bond, a carbon-carbon triple bond, a carbon-nitrogen double bond, and a carbon-nitrogen triple bond.
Dependencies are inferred from the claim text.