Semiconductor memory device
AssigneeKioxia Corporation
InventorKen KOMIYA
Life of this patent
Estimating the term…
Loading patent…
AssigneeKioxia Corporation
InventorKen KOMIYA
Estimating the term…
According to one embodiment, a semiconductor memory device includes the following structure. First word lines are stacked above a substrate. Second word lines are stacked above the first word lines. A selection gate line is provided above the second word lines. A first pillar penetrates the first word lines in a first direction orthogonal to an upper surface of the substrate. A second pillar penetrates the second word lines and the selection gate line in the first direction. The second word lines include an upper word line disposed around an upper layer portion of the second pillar, a middle word line disposed around a middle layer portion below the upper layer portion, and a lower word line disposed around a lower layer portion below the middle layer portion. A film thickness of the upper word line is thicker than that of the middle word line.
A semiconductor memory device comprising:
A semiconductor memory device comprising:
Dependencies are inferred from the claim text.