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US 2026/0040862 A1Published application
Substrate loading apparatus, substrate processing system including the same, and substrate processing method using the same
AssigneeSamsung Electronics Co., Ltd.
InventorsChanwook PARK, JUSUK KANG, JONGHO PARK, Hyun YANG, JAEMOK JUNG, Tae Oh HA
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Abstract
A substrate loading apparatus includes a housing that provides a space where a substrate is configured to be disposed, a transfer track in the housing on an upper side of the housing, and a particle removal device connected to the transfer track. The particle removal device includes a nozzle configured to inject a gas and a module housing that has an intake hole. When viewed in plan, the intake hole surrounds the nozzle.
Claims20
A substrate loading apparatus, comprising:
- a housing that provides a space where a substrate is configured to be disposed;
- a transfer track in the housing on an upper side of the housing;
- and
- a particle removal device connected to the transfer track,
- wherein the particle removal device includes:
- a nozzle configured to inject a gas;
- and
- a module housing that has an intake hole, and
- wherein, when viewed in plan, the intake hole surrounds the nozzle.
6 more elements
A substrate processing system, comprising:
- a substrate loading apparatus that includes a transfer track and a particle removal device that are connected to each other;
- and
- a substrate processing apparatus connected to the substrate loading apparatus,
- wherein the particle removal device includes a nozzle and an intake hole adjacent to the nozzle, and
- wherein the transfer track is configured to move the particle removal device.
2 more elements
A substrate processing method, comprising:
- transferring a substrate to a substrate processing apparatus;
- and
- processing the substrate,
- wherein the transferring of the substrate includes:
- preparing the substrate in a substrate loading apparatus that includes a particle removal device;
- removing contaminant particles on the substrate using the particle removal device;
- and
- changing an internal pressure of the substrate loading apparatus,
- wherein the removing of the contaminant particles includes moving the particle removal device on the substrate.
6 more elements
Dependencies are inferred from the claim text.