Stacked semiconductor devices with coupled backside contacts
AssigneeIntel Corporation
InventorsXia Li, Prashanth Aprameyan
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AssigneeIntel Corporation
InventorsXia Li, Prashanth Aprameyan
Estimating the term…
Techniques are provided herein to form an integrated circuit having stacked semiconductor devices with their source or drain regions coupled together via matching backside connections. In an example, FET (field effect transistor) devices may be formed on two different substrates and bonded together at their backsides such that backside contacts beneath each device substantially align at or near the bonding interface. The substrate beneath both the first FET and the second FET is removed, and backside contacts are formed beneath the source or drain regions of the first and second FETs. A bonding layer may also be formed on the backside of either the first FET or the second FET. The second FET is then flipped upside down and bonded to the backside of the first FET, such that the backside contacts from the first and second FET's are substantially aligned and are conductively coupled through the bonding layer.
An integrated circuit comprising:
An electronic device, comprising:
An integrated circuit comprising:
Dependencies are inferred from the claim text.