Method and apparatus for optimizing slot allocation of wafers in batch equipment of semiconductor manufacturing process

A method of optimizing a slot allocation of a wafer in a batch equipment of a semiconductor manufacturing process, the method comprising:

• loading wafer-specific characteristic data and slot allocation history data;
• grouping, in zone units, slots having similar process results of wafers according to a characteristic of the batch equipment;
• training a reinforcement learning model by limiting an action space to a number of slots included in a zone, and by using the wafer-specific characteristic data and the slot allocation history data;
• executing an optimization algorithm for determining a wafer-specific optimum slot location, based on the reinforcement learning model;
• selecting, based on a time for executing the optimization algorithm satisfying a system requirement time, the optimization algorithm as a final algorithm;
• and
• allocating a wafer-specific slot in the batch equipment in a next operation of the semiconductor manufacturing process, by using the final algorithm.

An electronic device comprising:

• a memory storing at least one instruction;
• and
• at least one processor configured to execute the at least one instruction stored in the memory to perform:
• train a reinforcement learning model by using wafer-specific characteristic data and slot allocation history data;
• execute an optimization algorithm for determining a wafer-specific optimum slot location, based on the reinforcement learning model;
• select, based on a time for executing the optimization algorithm satisfying a system requirement time, the optimization algorithm as a final algorithm;
• and
• by using the final algorithm, allocate a wafer-specific slot in batch equipment in a next process of a semiconductor manufacturing process.