Semiconductor photoresist compositions and methods of forming patterns using the compositions

A semiconductor photoresist composition, comprising:

• an organometallic compound;
• a salt compound comprising an anion represented by Chemical Formula 1;
• and
• a solvent:
• wherein, in Chemical Formula 1,
• L is a single bond, a substituted or unsubstituted C1 to C10 alkylene group, a substituted or unsubstituted C2 to C10 alkenylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C3 to C20 cycloalkenylene group, a substituted or unsubstituted C6 to C30 arylene group, a substituted or unsubstituted C2 to C30 heteroarylene group, or a combination thereof.