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US 2026/0036474 A1Published application
Strain gauge
AssigneeMINEBEA MITSUMI Inc.
InventorsShinya TODA, Toshiaki ASAKAWA, Atsushi KITAMURA, Shinichi NIWA
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Abstract
The present strain gauge includes a substrate and a resistor formed on the substrate. The resistor is made of a material mainly composed of Cr. A line width W and the film thickness T of the resistor are in a relationship of satisfying an expression (1) below such that the strain gauge has a transverse sensitivity ratio of 70% or less and a gauge factor of 5 or greater. w≤0.0177t2+0.1521t+2.9541—(1). In the expression (1), w=log W and t=log T.
Claims8
A strain gauge, comprising:
- a substrate;
- and
- a resistor formed on the substrate,
- wherein the resistor is made of a material mainly composed of Cr,
- a line width W and a film thickness T of the resistor are in a relationship of satisfying an expression (1) below such that the strain gauge has a transverse sensitivity ratio of 70% or less and a gauge factor of 5 or greater,
- w
- ≤
- 0.0177
- t
- 2
- +
- 0.1521
- t
- +
- 2.9541
- (
- 1
- )
- where in the expression (1), w=log W and t=log T.
16 more elements
Dependencies are inferred from the claim text.