Stress relaxation gas barrier film

A stress relaxation gas barrier film, comprising one or more cured film layers and one or more stress relaxation layers alternately stacked,

• the one or more cured film layers being a cured product of a polysilazane composition comprising a polysilazane compound represented by the following formula (1):
• wherein R are each independently a hydrogen atom or a group selected from an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 12 carbon atoms, an aralkyl group having 7 to 12 carbon atoms, and an alkoxy group having 1 to 6 carbon atoms, and “n” is an integer of 2 to 20,000,
• the one or more stress relaxation layers being a cured product of a silicone resin composition comprising a linear organopolysiloxane represented by the following formula (A-1), and each having a film thickness of 0.1 to 15.0 μm:
• wherein R1 are each independently an alkyl group having 1 to 3 carbon atoms or an alkenyl group having 2 to 3 carbon atoms, R2 are each independently a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, R3 are each independently a group selected from an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 12 carbon atoms, and an aralkyl group having 7 to 12 carbon atoms, “a” is an integer satisfying 1≤a<200, and “b” is an integer satisfying 0≤b<200, provided that a+b satisfies 10≤a+b<200.