A dark-field confocal microscopy measurement apparatus based on aperture scanning of vortex illumination, comprising a vortex illumination generation module, a vortex illumination aperture scanning module, a sample scanning module, and a dark-field lock-in detection module;
- the vortex illumination generation module is configured to generate vortex illumination;
- the vortex illumination aperture scanning module comprises a mirror, a uniaxial scanning galvanometer, a beam expander, a non-polarizing beam splitter, and an objective lens sequentially arranged in a light propagation direction of the vortex illumination generated by the vortex illumination generation module;
- the non-polarizing beam splitter is configured to split a beam output by the beam expander and a signal return light reflected by a sample;
- the objective lens is configured to:
- focus the split beam output by the beam expander onto the sample, and collect the signal return light to be incident on the non-polarizing beam splitter;
- the uniaxial scanning galvanometer is configured to control a beam propagation direction of the vortex illumination reflected by the mirror, such that during scanning, a central dark spot of the vortex illumination incident on the objective lens moves back and forth from an entrance pupil center within an entrance pupil range of the objective lens, and a focused light spot focused on the sample oscillates and scans back and forth a small range of the sample to generate oscillatory signals to highlight scattered signals from nano-scale defects of the sample, wherein the range is determined based on an aperture of the objective lens and a wavelength of light incident on the objective lens;
- the sample scanning module is configured to control the sample to move during scanning, to enable the focused light spot on the sample to perform two-dimensional (2D) scanning or three-dimensional (3D) scanning in the sample;
- the dark-field lock-in detection module sequentially comprises a diaphragm, a focusing lens, a pinhole, a photomultiplier, and a lock-in amplifier sequentially arranged in a light propagation direction of the signal return light split by the non-polarizing beam splitter;
- the diaphragm is configured to filter out reflected light in the signal return light and retain scattered light in a beam center;
- and
- the focusing lens is configured to focus the scattered light output by the diaphragm to be incident on the photomultiplier through the pinhole;
- the photomultiplier is configured to convert a light signal of the received scattered light into an electric signal;
- and the lock-in amplifier is configured to perform lock-in amplification processing on the electric signal output by the photomultiplier, and output the oscillatory signals generated during scanning, to detect nano-scale defects through an amplification effect of the oscillatory signals on scattered signals of the nano-scale defects.