Method to measure light loss of anisotropic crystal substrate
AssigneeApplied Materials, Inc.
InventorsYupeng ZHU, Jinxin FU
Life of this patent
Estimating the term…
Loading patent…
AssigneeApplied Materials, Inc.
InventorsYupeng ZHU, Jinxin FU
Estimating the term…
Embodiments of the present disclosure relate to a method of optical device metrology and a device. The method includes introducing a light beam into an optical device during a first time period at an initial angle, the optical device including an anisotropic crystal optical substrate, the optical device including a first surface and a second surface, propagating the light beam through the optical device, the light beam including a transverse electric polarization light and a transverse magnetic polarization light, measuring a plurality of measurements, during the first time period, the plurality of measurements including a quantity of the transverse electric polarization light and the transverse magnetic polarization light transmitted from a plurality of locations on the first surface or the second surface during the first time period, wherein the measuring is performed by a detector, and using the measurements during the first time period to determine optical loss.
A method of optical device metrology comprising:
A method of optical device metrology comprising:
An optical device comprising:
Dependencies are inferred from the claim text.