Selective molybdenum fill

Abstract

A molybdenum silicide layer is formed on a bottom surface in a recessed feature in a silicon or silicon-germanium substrate. The bottom surface may be a silicon or silicon-germanium. A first molybdenum lay er may be deposited on or over the molybdenum silicide layer to fill the recessed feature. In some cases, a second molybdenum layer may be formed on the molybdenum silicide layer. In some cases, the second molybdenum layer may be exposed to nitrogen radicals or nitrogen-containing radicals, forming a molybdenum nitride layer on the second molybdenum layer.

Dependencies are inferred from the claim text.