System and method for process chemistry abatement and recycling
AssigneeTokyo Electron Limited
InventorLauren M. Otto
Life of this patent
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Abstract
A processing system is provided for capturing and recycling process gases from semiconductor manufacturing operations. The system includes a process chamber configured to process a substrate and an exhaust system coupled to the process chamber and configured to remove process effluent from the process chamber. An abatement system including a first metal-organic framework (MOF) container is coupled downstream of the exhaust system, where the first MOF container is configured to capture a first gas species of the process effluent.
Claims20
A processing system, the system comprising:
- a process chamber configured to process a substrate;
- an exhaust system coupled to the process chamber and configured to remove process effluent from the process chamber;
- and
- an abatement system comprising a first metal-organic framework (MOF) container coupled downstream of the exhaust system, wherein the first MOF container is configured to capture a first gas species of the process effluent.
A processing system, the system comprising:
- an abatement system comprising a first metal-organic framework (MOF) container configured to capture a first gas species of a process effluent received from a process chamber;
- and
- a recycling system configured to couple to the first MOF container, the recycling system comprising:
- an extraction pump configured to create a pressure gradient to extract MOF captured gases comprising the first gas species from the first MOF container, and
- a purification system coupled downstream of the extraction pump and configured to increase concentration of the first gas species in the MOF captured gases.
A method of operating a processing system, the method comprising:
- introducing process gases into a process chamber of the processing system;
- processing a substrate in the process chamber using the process gases;
- directing process effluent from the process chamber through a multi-stage filtration system, wherein the multi-stage filtration system removes reaction byproducts from the process effluent;
- and
- capturing a first gas species from the process effluent using a first metal-organic framework (MOF) container.
Dependencies are inferred from the claim text.