Thermally optimized extraction plate for ion implanter
OwnerAdam M. McLaughlin, Craig R. Chaneyinventors
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Abstract
An ion source and ion implantation system are disclosed that utilize an extraction plate that controls the flow of heat to create a region around the extraction aperture that has an elevated temperature. The extraction plate has thicker portions that correspond to the hottest components in the ion source. These thicker portions extend toward the extraction aperture to bring the heat toward the extraction aperture. The thicker portions may be located directly above the plasma generator, which may be an indirectly heated cathode. Further, the thicker portions may also be located directly above the repeller and/or side electrodes.
Claims20
An ion source, comprising:
- an arc chamber having a first end, a second end and side walls connecting the first end and the second end, wherein a direction from the first end to the second end is defined as a width direction and a direction from a first sidewall to an opposite sidewall is defined as a height direction;
- a cathode disposed within the arc chamber at the first end;
- and
- an extraction plate disposed on the arc chamber, the extraction plate comprising:
- an extraction aperture;
- a first thicker portion disposed above the cathode, referred to as a cathode heat capture region;
- and
- a second thicker portion, referred to as a cathode heat conduction region, disposed in the width direction between the cathode heat capture region and the extraction aperture, wherein heat from the cathode travels through the cathode heat capture region and the cathode heat conduction region to an area around the extraction aperture to increase a temperature of the area.
An extraction plate for use with an indirectly heated cathode ion source and adapted to be disposed on an arc chamber containing a cathode at a first end and a repeller at a second end, the extraction plate comprising:
- an extraction aperture;
- a first thicker portion disposed above the cathode, referred to as a cathode heat capture region;
- a second thicker portion, referred to as a cathode heat conduction region, disposed in a width direction between the cathode heat capture region and the extraction aperture, wherein heat from the cathode travels through the cathode heat capture region and the cathode heat conduction region to an area around the extraction aperture to increase a temperature of the area;
- a third thicker portion disposed above the repeller, referred to as a repeller heat capture region;
- and
- a fourth thicker portion, referred to as a repeller heat conduction region, disposed in the width direction between the repeller heat capture region and the extraction aperture, wherein heat from the repeller travels through the repeller heat capture region and the repeller heat conduction region to the area around the extraction aperture to increase the temperature of the area.
Dependencies are inferred from the claim text.