Infrared sensor
AssigneeHon Hai Precision Industry Co., Ltd.
InventorsKuang-Hao CHIANG, Shang-Yu CHUANG
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Abstract
A method for forming an infrared sensor includes depositing an infrared sensing material layer over a platform of a reference pixel including a resistor; depositing a light absorbing layer over the infrared sensing material layer; patterning the light absorbing layer to form a lateral light absorbing portion and a protruding light absorbing portion on the lateral light absorbing portion; forming a spacer on a sidewall of the protruding light absorbing portion; comformally depositing a light shielding metal layer over the protruding light absorbing portion and the spacer.
Claims4
A method for forming an infrared sensor, comprising:
- depositing an infrared sensing material layer over a platform of a reference pixel including a resistor;
- depositing a light absorbing layer over the infrared sensing material layer;
- patterning the light absorbing layer to form a lateral light absorbing portion and a protruding light absorbing portion on the lateral light absorbing portion;
- forming a spacer on a sidewall of the protruding light absorbing portion;
- and
- comformally depositing a light shielding metal layer over the protruding light absorbing portion and the spacer.
Dependencies are inferred from the claim text.