Processing method, method of manufacturing semiconductor device, processing apparatus, and recording medium
AssigneeKokusai Electric Corporation
InventorKimihiko NAKATANI
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Abstract
There is provided a technique that includes: (a) forming a first film, containing at least a portion of a partial structure X and a partial structure Z derived from a partial structure Y, on a substrate by supplying, to the substrate, a precursor containing both the partial structure X and the partial structure Y, or a first precursor containing the partial structure X and a second precursor containing the partial structure Y; and (b) modifying the first film formed on the substrate into a second film by exposing the first film to a modifying agent, the second film containing at least a portion of the partial structure X and a smaller amount of the partial structure Z than that contained in the first film.
Claims22
A processing method comprising:
- (a) forming a first film, containing at least a portion of a partial structure X and a partial structure Z derived from a partial structure Y, on a substrate by supplying, to the substrate, a precursor containing both the partial structure X and the partial structure Y, or a first precursor containing the partial structure X and a second precursor containing the partial structure Y;
- and
- (b) modifying the first film formed on the substrate into a second film by exposing the first film to a modifying agent, the second film containing at least a portion of the partial structure X and a smaller amount of the partial structure Z than that contained in the first film.
A processing apparatus comprising:
- a precursor supply system configured to supply, to a substrate, a precursor containing both a partial structure X and a partial structure Y, or a first precursor containing the partial structure X and a second precursor containing the partial structure Y;
- a modifying agent exposure system configured to expose the substrate to a modifying agent;
- and
- a controller configured to be capable of controlling the precursor supply system and the modifying agent exposure system so as to perform a process including:
- (a) forming a first film, containing at least a portion of the partial structure X and a partial structure Z derived from the partial structure Y, on the substrate by supplying, to the substrate, the precursor, or the first precursor and the second precursor;
- and
- (b) modifying the first film formed on the substrate into a second film by exposing the first film to the modifying agent, the second film containing at least a portion of the partial structure X and a smaller amount of the partial structure Z than that contained in the first film.
A non-transitory computer-readable recording medium storing a program that causes, by a computer, a processing apparatus to perform a process, the process comprising:
- (a) forming a first film, containing at least a portion of a partial structure X and a partial structure Z derived from a partial structure Y, on a substrate by supplying, to the substrate, a precursor containing both the partial structure X and the partial structure Y, or a first precursor containing the partial structure X and a second precursor containing the partial structure Y;
- and
- (b) modifying the first film formed on the substrate into a second film by exposing the first film to a modifying agent, the second film containing at least a portion of the partial structure X and a smaller amount of the partial structure Z than that contained in the first film.
Dependencies are inferred from the claim text.