Plasma processing system and method of mounting annular member

A plasma processing system comprising:

• a plasma processing apparatus configured to perform plasma processing on a substrate;
• a transfer apparatus connected to the plasma processing apparatus;
• and
• a controler,
• wherein:
• the plasma processing apparatus includes a substrate support which includes a support unit having a substrate mounting surface on which the substrate is mounted and an annular member mounting surface on which an annular member disposed to surround the substrate is mounted;
• the substrate support includes a plurality of insertion holes which pass through the annular member mounting surface and are formed in the support unit, lifters which are provided in the insertion holes and are elevated to protrude from the annular member mounting surface, an elevating mechanism which elevates the lifters, and a temperature adjustment mechanism which adjusts a temperature of the support unit;
• the transfer apparatus includes a transfer mechanism configured to transfer the annular member to the substrate support;
• concave portions, into which upper end portions of the lifters are fitted, are formed in a bottom surface of the annular member so as to be recessed upward;
• and
• the controler controls the elevating mechanism, the temperature adjustment mechanism, and the transfer mechanism to perform a process of adjusting the temperature of the support unit to a preset temperature at which a position of each of the concave portions of the annular member matches positions of the corresponding lifter and insertion hole and a process of transferring the annular member above the support unit, receiving the annular member with the lifter protruding from the annular member mounting surface of the support unit of which the temperature is adjusted to the preset temperature, and mounting the annular member on the annular member mounting surface.