Plasma processing apparatus and dielectric window

A dielectric window constituting an upper part of a chamber of a plasma processing apparatus, the dielectric window comprising:

• a plurality of gas channels extending in a radial direction of the dielectric window and each formed so that distances from a gas supply port connected to a gas supply section to gas introduction ports for introducing processing gas into the chamber are equal to each other, the gas supply section supplying the processing gas to the chamber,
• wherein each of the gas introduction ports is provided at a position that overlaps a second surrounding region in a longitudinal direction with respect to an antenna assembly that is disposed above the chamber, is set with a central region, a first surrounding region surrounding the central region, the second surrounding region surrounding the first surrounding region, and a third surrounding region surrounding the second surrounding region, and includes a primary coil disposed in the third surround region and a secondary coil disposed in the first surrounding region.

A dielectric window constituting an upper part of a chamber of a plasma processing apparatus, the dielectric window comprising:

• a plurality of gas channels extending in a radial direction of the dielectric window and each formed so that distances from a gas supply port connected to a gas supply section to gas introduction ports for introducing processing gas into the chamber are equal to each other, the gas supply section supplying the processing gas to the chamber,
• wherein each of the gas introduction ports is provided at a position that overlaps a second surrounding region in a longitudinal direction with respect to an antenna assembly that is disposed above the chamber, is set with a central region, a first surrounding region surrounding the central region, and the second surrounding region surrounding the first surrounding region, and includes a coil disposed in the first surrounding region.