Substrate processing system

A substrate processing system, comprising:

• a batch processor configured to collectively process substrates;
• a single-wafer processor configured to process the substrates one by one;
• an interface configured to deliver the substrates from the batch processor to the single-wafer processor;
• and
• a control circuit,
• wherein the interface includes:
• a substrate holder configured to hold a substrate among the substrates;
• a processing liquid supply configured to supply a processing liquid, which suppresses drying of an upper surface of the substrate held by the substrate holder, to the upper surface of the substrate;
• and
• a sensor configured to sense a state of the substrate held by the substrate holder,
• wherein the single-wafer processor includes a transferrer configured to retrieve the substrate from the substrate holder, and
• wherein the control circuit performs:
• control for calculating a slope of the substrate based on the state of the substrate measured by the sensor;
• and
• control for changing an operation of the transferrer based on the calculated slope of the substrate.