Device and method for measuring a component, and lithography system

Abstract

An apparatus (1) for measuring a component (2) of a lithography system, having a vibration isolator device (3), a measuring system (4) mounted on the vibration isolator device and a supply device (5) supplying the measuring system via a data connection (6) transferring data between the supply device and the measuring system, a current connection (7) transferring electrical energy between the supply device and the measuring system, a gas connection (8) transferring a gas between the supply device and the measuring system, a liquid connection (9) transferring a liquid between the supply device and the measuring system, and/or a vacuum connection (10) transferring a vacuum between the supply device and the measuring system. A decoupling device (11) mechanically at least partially decouples the measuring system from the supply device at least during the measurement of the component.

Dependencies are inferred from the claim text.