Pattern forming method

A pattern forming method comprising:

• a pre-wetting step of coating a substrate with a chemical liquid so as to obtain a pre-wetted substrate;
• a resist film forming step of forming a resist film on the pre-wetted substrate by using an actinic ray-sensitive or radiation-sensitive resin composition;
• an exposure step of exposing the resist film;
• and
• a development step of developing the exposed resist film by using a developer,
• wherein the chemical liquid comprising:
• a mixture of two or more kinds of organic solvents;
• wherein the organic solvents are selected from the group consisting of compounds represented by Formulae (1) to (7), compounds represented by Formulae (9) to (11), a 3- to 5-membered cyclic ketone compound that may have a substituent, a cyclic ketone compound with 6 or more members that may have a substituent, a lactone compound, and a lactam compound,
• the chemical liquid contains or does not contain an ether-based compound other than the compounds represented by Formula (1), Formula (5), Formula (7), and Formulae (9) to (11),
• in a case where the chemical liquid contains the ether-based compound, a content of the ether-based compound in the chemical liquid is less than 10 mass ppm with respect to a total mass of the chemical liquid, and
• the chemical liquid does not include a chemical liquid in which the mixture is formed of a lactone compound and the compound represented by Formula (5), a chemical liquid in which the mixture is formed of the cyclic ketone compound with 6 or more members that may have a substituent and the compound represented by Formula (1), a chemical liquid in which the mixture is formed of a lactone compound, the compound represented by Formula (1), and the compound represented by Formula (5), and a chemical liquid in which the mixture is formed of the compound represented by Formula (1) and the compound represented by Formula (3),
• in Formula (1), R11 and R12 each independently represent an alkyl group, R13 represents a hydrogen atom or an alkyl group, and L1 represents a single bond or an alkylene group,
• in Formula (2), R21 and R22 each independently represent a hydrogen atom or an alkyl group, and L2 represents a single bond or an alkylene group,
• in Formula (3), R31 and R32 each independently represent a hydrogen atom or an alkyl group, at least one of a plurality of R32's represents an alkyl group, and L3 represents a single bond or an alkylene group,
• in Formula (4), R41 and R42 each independently represent an alkyl group,
• in Formula (5), R51 and R52 each independently represent an alkyl group, and L5 represents a single bond or an alkylene group,
• in Formula (6), R61 and R62 each independently represent an alkyl group, and R61 and R62 may form a ring by being bonded to each other,
• in Formula (7), R71, R72, R73, and R74 each independently represent an alkyl group, and R71 and R72 may form a ring by being bonded to each other,
• in Formula (9), R91 and R92 each independently represent an alkyl group,
• in Formula (10), L10 represents a single bond or an alkylene group, and R101 represents an alkyl group, and
• in Formula (11), L11 represents a single bond or an alkylene group, and R111 represents an alkyl group,
• wherein the actinic ray-sensitive or radiation-sensitive resin composition contains a resin including at least one kind of repeating unit selected from the group consisting of a repeating unit represented by Formula (a), a repeating unit represented by Formula (b), a repeating unit represented by Formula (c), a repeating unit represented by Formula (d), and a repeating unit represented by Formula (e),
• Rx1 to Rx5 each independently represent a hydrogen atom or an alkyl group which may have a substituent,
• R1 to R4 each independently represent a monovalent substituent,
• p1 to p4 each independently represent 0 or a positive integer,
• Ra represents a linear or branched alkyl group,
• T1 to T5 each independently represent a single bond or a divalent linking group,
• R5 represents a monovalent organic group,
• a to e represent mol % and each independently represent a number included in a range of 0≤a≤100, 0≤b≤100, 0≤c<100, 0≤d<100, and 0≤e<100, provided that a+b+c+d+e=100 and a+b≠0, and
• the repeating unit represented by Formula (e) is different from all of the repeating units represented by Formula (a) to Formula (d).