Organic polymer, semiconductor hard mask composition comprising same, and patterning method using same
AssigneeHunetplus Co., Ltd.
InventorsHyuk Jin CHA, Keun Joo LEE, Deogbae KIM, Keun Soo KIM
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Abstract
Disclosed is a hard mask polymer for semiconductor applications including a polymer of specific monomeric components, achieving improved etch resistance, solubility, and mechanical properties. The hard mask polymer is an organic polymer including a structure represented by Formula 1: wherein R1 is a hydrocarbon including one or more benzene ring structures and n is an integer from 1 to 10000. Also disclosed are a hard mask composition for semiconductor applications including the organic polymer and a patterning method using the hard mask composition.
Claims13
A hard mask polymer for semiconductor applications comprising a structure represented by Formula 1:
- wherein R1 is a hydrocarbon comprising one or more benzene ring structures and n is an integer from 1 to 10000.
Dependencies are inferred from the claim text.