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US 2025/0389869 A1Published application
Optical filter, sensor system comprising same, and method for manufacturing halogenated amorphous silicon thin film for optical filter
AssigneeYoung Jin SONG
InventorsYoung Jin SONG, Chang Kwon HWANGBO
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Abstract
According to the present invention, provided are: an optical filter capable of exhibiting low extinction coefficient characteristics in a narrowband of approximately 800 nm-1100 nm while having a high refractive index; and a sensor system comprising same.
Claims10
An optical filter comprising:
- a first mirror layer where a first high refraction material layer and a first low refraction material layer are alternately deposited;
- a spacer layer continuously deposited above one side surface of the first mirror layer, and comprises a plurality of second high refraction material layers;
- and
- a second mirror layer located to face the first mirror layer with the spacer layer interposed therebetween, and where a third high refraction material layer and a third low refraction material layer are alternately deposited, and
- wherein in a wavelength range of 800 nm to 1100 nm, one or more of the first high refraction material layer, the second high refraction material layer, and the third high refraction material layer comprising a silicon material with amorphous property, have a refractive index of 3.0 or more, and an optical extinction coefficient of 0.001 or below, and wherein the silicon material comprises H, Si, or a halogen element.
2 more elements
A sensor system comprising:
- an optical filter that includes
- a first mirror layer where a first high refraction material layer and a first low refraction material layer are alternately deposited;
- a spacer layer continuously deposited above one side surface of the first mirror layer, and comprises a plurality of second high refraction material layers;
- and
- a second mirror layer located to face the first mirror layer with the spacer layer interposed therebetween, and where a third high refraction material layer and a third low refraction material layer are alternately deposited, and
- wherein in a wavelength range of 800 nm to 1100 nm, one or more of the first high refraction material layer, the second high refraction material layer, and the third high refraction material layer comprising a silicon material with amorphous property, have a refractive index of 3.0 or more, and an optical extinction coefficient of 0.001 or below, and wherein the silicon material comprises H, Si, or a halogen element;
- and
- a light source emitting light of a wavelength range of 800 nm to 1100 nm in order to generate a reflected light reaching the optical filter;
- and
- a sensor disposed on a processing path of the reflected light passing through the optical filter, and receives 3D information about a subject, included in the reflected light.
7 more elements
Dependencies are inferred from the claim text.