Method for manufacturing three-dimensional structure using conductive floating mask

A method of manufacturing a three-dimensional structure, the method comprising:

• (S1) a step of disposing a lower substrate and a conductive mask provided with a plurality of holes above the lower substrate to be spaced apart within a grounded reactor;
• (S2) a step of forming an electrostatic lens around the hole of the mask by generating electric fields of different sizes in the conductive mask and the lower substrate, respectively;
• (S3) a step of introducing charged nanoparticles through an upper inlet of the reactor to induce passage through the mask hole by the electrostatic lens and deposition on the lower substrate;
• and
• one or more steps of the following steps (S4) and (S5):
• (S4) a step of adjusting an electric field intensity between the conductive mask and the substrate to induce a change in size of a structure;
• and
• (S5) a step of controlling a shape of a growing three-dimensional nanostructure while transporting the lower substrate in three dimensions.