Substrate processing method and substrate processing apparatus

A substrate processing apparatus comprising:

• an inner bath that forms an opening through which a substrate vertically passes and a storage space that stores the substrate that has passed downward through the opening, the inner bath storing in the storage space a processing liquid to be supplied to the substrate;
• a lifter that holds the substrate in an upright posture;
• an elevating/lowering actuator that vertically moves the lifter between an upper position where the substrate held on the lifter is arranged over the opening of the inner bath and a lower position where the substrate held on the lifter is arranged in the storage space of the inner bath;
• and
• a first outer nozzle and a second outer nozzle that are arranged at positions higher than a position of the inner bath so as to be positioned opposite to each other with respect to a vertical line passing through a center of the substrate when viewed in a direction perpendicular to the substrate held on the lifter, and that discharge the processing liquid toward the substrate held on the lifter, wherein
• the first outer nozzle and the second outer nozzle are caused to perform causing the first outer nozzle to discharge the processing liquid while causing the second outer nozzle to stop discharging the processing liquid, and causing the second outer nozzle to discharge the processing liquid while causing the first outer nozzle to stop discharging the processing liquid.