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US 2025/0374530 A1Published application
Bit line contact structure, semiconductor device with contact-isolating spacers, and method for fabricating the same
AssigneeNanya Technology Corporation
InventorYI-TING TSAI
Life of this patent
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Abstract
The present application discloses a bit line contact structure, a semiconductor device, and a method for fabricating the semiconductor device. The bit line contact structure includes a bit line contact having a rectangular cross-sectional profile in a top-view perspective and including two first sides parallel to each other and two second sides parallel to each other and perpendicular to the two first sides; and two contact-isolating spacers respectively and correspondingly covering the two first sides of the bit line contact.
Claims6
A bit line contact structure, comprising:
- a bit line contact having a rectangular cross-sectional profile in a top-view perspective and comprising two first sides parallel to each other and two second sides parallel to each other and perpendicular to the two first sides;
- and
- two contact-isolating spacers respectively and correspondingly covering the two first sides of the bit line contact.
Dependencies are inferred from the claim text.