Pulsed electric field processing apparatus

Abstract

A pulsed electric field processing apparatus includes: a pulsed power supply that generates a pulse voltage; a pair of electrodes that generates a pulse electric field; a processing chamber that is disposed between the electrodes and includes a space through which a processing target object in a liquid state passes and in which the pulse electric field is generated; a temperature computing unit that computes a processing temperature that is a temperature of the processing target object in the processing chamber on the basis of a resistance value and a preset calibration value, the resistance value being acquired from the pulse voltage and a pulse current flowing through the processing target object in the processing chamber when the pulse voltage is applied to the electrodes; and a power supply control unit that controls the pulsed power supply on the basis of the processing temperature and a preset target temperature.

Dependencies are inferred from the claim text.