Method and apparutus for coating active material

An active material coating method comprising:

• forming, by a coating line forming device, a first coating line and a second coating line spaced apart from the first coating line on a first surface of a base material;
• forming, by a coating layer forming device, a first active material coating layer between the first coating line and the second coating line on the first surface of the base material;
• forming, by the coating line forming device, a third coating line and a fourth coating line spaced apart from the third coating line on a second surface of the base material;
• forming, by the coating layer forming device, a second active material coating layer between the third coating line and the fourth coating line on the second surface of the base material;
• forming, by an etching device, a first etched active material coating layer by etching at least a part of the first active material coating layer;
• determining, by a controller, a positional relationship between the first etched active material coating layer on the first surface of the base material and the second active material coating layer on the second surface of the base material;
• and
• forming, by the etching device, a second etched active material coating layer by etching at least a part of the second active material coating layer based on the positional relationship.