Method and apparatus for preparing samples for imaging

A method of observing a defect in a sample, comprising:

• loading the sample into a chamber of a dual beam system;
• positioning a probe tip to a first location on the sample;
• discharging the sample through the probe tip;
• after the discharging, positioning the probe tip to a second location on the sample;
• supplying a voltage to the sample through the probe tip;
• after the supplying of the voltage, identifying a region of the sample that contains the defect;
• ion milling the sample to free the region from the sample by an ion beam of the dual beam system;
• lifting out the region by the probe tip;
• securing the region to a grid inside the chamber;
• and
• observing the defect by an electron beam of the dual beam system.

An apparatus for charged particle beam microscopy, comprising:

• a probe tip;
• a probe tip holder gripping the probe tip, wherein the probe tip holder is electrically connected to the probe tip;
• a first electric wire attached to the probe tip holder, wherein the first electric wire provides electrical connection between the probe tip holder and a ground line;
• a second electric wire attached to the probe tip holder, wherein the second electric wire provides electrical connection between the probe tip holder and a voltage line;
• and
• an elongated shaft coupled to the probe tip holder, wherein the elongate shaft passes movement control to the probe tip through the probe tip holder.