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US 2025/0352949 A1Published application
Apparatus and method of trapping an exhaust material from a substrate-processing process and apparatus for processing a substrate including the trapping apparatus
AssigneeSamsung Electronics Co., Ltd.
InventorsUihyoung LEE, Suji GIM, Hongsik PARK, Taeheon LEE
Life of this patent
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Abstract
An apparatus for trapping an exhaust material from a substrate-processing process includes: a cyclone configured to provide the exhaust material with a swirling flow, wherein the exhaust material is discharged from the substrate-processing process using a reaction gas; an atomization module for providing the cyclone with a mist to convert the exhaust material into a powder through a wet oxidation reaction; and a collector configured to collect the powder.
Claims7
A method of trapping an exhaust material from a substrate-processing process, the method comprising:
- providing the exhaust material with a mist such that the exhaust material is converted into a powder through a wet oxidation reaction, wherein the exhaust material is discharged from the substrate-processing process;
- and
- collecting the powder in a collector.
Dependencies are inferred from the claim text.