Cleavable comonomer strategy for accelerating removal of gel nail polish

A method of removing a cosmetic, polymer composition from a nail bed, comprising:

• immersing a nail bed coated with a polymer composition in a removal solution comprising cysteine and an aqueous base, the polymer composition comprising
• a first monomer;
• a second monomer;
• and
• a third monomer of Formula III or a tautomer or salt thereof
• wherein X1 is S or O;
• each instance of R10 is independently halogen, substituted or unsubstituted alkyl, substituted or unsubstituted carbocyclyl, substituted or unsubstituted heterocyclyl, substituted or unsubstituted aryl, substituted or unsubstituted heteroaryl, —CN, —ORb, —SCN, —SRb, —SSRb, —N3, —NO, —N(Rb)2, —NO2, —C(═O)Rb, —C(═O)ORb, —C(═O)SRb, —C(═O)N(Rb)2, —C(═NRb)Rb, —C(═NRb)ORb, —C(═NRb)SRb, —C(═NRb)N(Rb)2, —S(═O)Rb, —S(═O)ORb, —S(═O)SRb, —S(═O)N(Rb)2, —S(═O)2Rb, —S(═O)2ORb, —S(═O)2SRb, —S(═O)2N(Rb)2, —OC(═O)Rb, —OC(═O)ORb, —OC(═O)SRb, —OC(═O)N(Rb)2, —OC(═NRb)Rb, —OC(═NRb)ORb, —OC═NRb)SRb, —OC(═NRb)N(Rb)2, —OS(═O)Rb, —OS(═O)ORb, —OS(═O)SRb, —OS(═O)N(Rb)2, —OS(═O)2Rb, —OS(═O)2ORb, —OS(═O)2SRb, —OS(═O)2N(Rb)2, —ON(Rb)2, —SC(═O)Rb, —SC(═O)ORb, —SC(═O)SRb, —SC(═O)N(Rb)2, —SC(═NRb)Rb, —SC(═NRb)ORb, —SC(═NRb)SRb, —SC(═NRb)N(Rb)2, —NRbC(═O)Rb, —NRbC(═O)ORb, —NRbC(═O)SRb, —NRbC(═O)N(Rb)2, —RbC(═NRb)Rb, —NRbC(═NRb)ORb, —NRbC(═NRb)SRb, —NRbC(═NRb)N(Rb)2, —NRbS(═O)Rb, NRbS(═O)ORb, —NRbS(═O)SRb, —NRbS(═O)N(Rb)2, —NRbS(═O)2Rb, —RbS(═O)2ORb, —NRbS(═O)2SRb, —NRbS(═O)2N(Rb)2, —Si(Rb)3, —Si(Rb)2ORb, —Si(Rb)(ORb)2, —Si(ORb)3, —OSi(Rb)3, —OSi(Rb)2ORb, —OSi(Rb)(ORb)2, or —OSi(ORb)3;
• each instance of R11 is independently halogen, substituted or unsubstituted alkyl, substituted or unsubstituted carbocyclyl, substituted or unsubstituted heterocyclyl, substituted or unsubstituted aryl, substituted or unsubstituted heteroaryl, —CN, —ORb, —SCN, —SRb, —SSRb, —N3, —NO, —N(Rb)2, —NO2, —C(═O)Rb, —C(═O)ORb, —C(═O)SRb, —C(═O)N(Rb)2, —C(═NRb)Rb, —C(═NRb)ORb, —C(═NRb)SRb, —C(═NRb)N(Rb)2, —S(═O)Rb, —S(═O)ORb, —S(═O)SRb, —S(═O)N(Rb)2, —S(═O)2Rb, —S(═O)2ORb, —S(═O)2SRb, —S(═O)2N(Rb)2, —OC(═O)Rb, —OC(═O)ORb, —OC(═O)SRb, —OC(═O)N(Rb)2, —OC(═NRb)Rb, —OC(═NRb)ORb, —OC(═NRb)SRb, —OC(═NRb)N(Rb)2, —OS(═O)Rb, —OS(═O)ORb, —OS(═O)SRb, —OS(═O)N(Rb)2, —OS(═O)2Rb, —OS(═O)2ORb, —OS(═O)2SRb, —OS(═O)2N(Rb)2, —ON(Rb)2, —SC(═O)Rb, —SC(═O)ORb, —SC(═O)SRb, —SC(═O)N(Rb)2, —SC(═NRb)Rb, —SC(═NRb)ORb, —SC(═NRb)SRb, —SC(═NRb)N(Rb)2, —NRbC(═O)Rb, —NRbC(═O)ORb, —NRbC(═O)SRb, —NRbC(═O)N(Rb)2, —NRbC(═NRb)Rb, —NRbC(═NRb)ORb, —NRbC(═NRb)SRb, —NRbC(═NRb)N(Rb)2, —NRbS(═O)Rb, —NRbS(═O)ORb, —NRbS(═O)SRb, —NRbS(═O)N(Rb)2, —NRbS(═O)2Rb, —NRbS(═O)2ORb, —NRbS(═O)2SRb, —NRbS(═O)2N(Rb)2, —Si(Rb)3, —Si(Rb)2ORb, —Si(Rb)(ORb)2, —Si(ORb)3, —OSi(Rb)3, —OSi(Rb)2ORb, —OSi(Rb)(ORb)2, or —OSi(ORb)3;
• n3 is 0, 1, 2, 3, or 4, n4 is 0, 1, 2, 3, or 4, and at least one of n3 and n4 is 1, 2, 3, or 4;
• provided that no instance of R10 and R11 comprises one or more non-aromatic unsaturated CC bonds.

A nail polish kit, comprising:

• a nail polish composition, further comprising a first monomer, a second monomer, and a third monomer of Formula III or a tautomer or salt thereof:
• wherein:
• X1 is S or O;
• each instance of R10 is independently halogen, substituted or unsubstituted alkyl, substituted or unsubstituted carbocyclyl, substituted or unsubstituted heterocyclyl, substituted or unsubstituted aryl, substituted or unsubstituted heteroaryl, —CN, —ORb, —SCN, —SRb, —SSRb, —N3, —NO, —N(Rb)2, —NO2, —C(═O)Rb, —C(═O)ORb, —C(═O)SRb, —C(═O)N(Rb)2, —C(═NRb)Rb, —C(═NRb)ORb, —C(═NRb)SRb, —C(═NRb)N(Rb)2, —S(═O)Rb, —S(═O)ORb, —S(═O)SRb, —S(═O)N(Rb)2, —S(═O)2Rb, —S(═O)2ORb, —S(═O)2SRb, —S(═O)2N(Rb)2, —OC(═O)Rb, —OC(═O)ORb, —OC(═O)SRb, —OC(═O)N(Rb)2, —OC(═NRb)Rb, —OC(═NRb)ORb, —OC═NRb)SRb, —OC(═NRb)N(Rb)2, —OS(═O)Rb, —OS(═O)ORb, —OS(═O)SRb, —OS(═O)N(Rb)2, —OS(═O)2Rb, —OS(═O)2ORb, —OS(═O)2SRb, —OS(═O)2N(Rb)2, —ON(Rb)2, —SC(═O)Rb, —SC(═O)ORb, —SC(═O)SRb, —SC(═O)N(Rb)2, —SC(═NRb)Rb, —SC(═NRb)ORb, —SC(═NRb)SRb, —SC(═NRb)N(Rb)2, —NRbC(═O)Rb, —NRbC(═O)ORb, —NRbC(═O)SRb, —NRbC(═O)N(Rb)2, —NRbC(═NRb)Rb, —NRbC(═NRb)ORb, —NRbC(═NRb)SRb, —NRbC(═NRb)N(Rb)2, —NRbS(═O)Rb, —NRbS(═O)ORb, —NRbS(═O)SRb, —NRbS(═O)N(Rb)2, —NRbS(═O)2Rb, —NRbS(═O)2ORb, —NRbS(═O)2SRb, —NRbS(═O)2N(Rb)2, —Si(Rb)3, —Si(Rb)2ORb, —Si(Rb)(ORb)2, —Si(ORb)3, —OSi(Rb)3, —OSi(Rb)2ORb, —OSi(Rb)(ORb)2, or —OSi(ORb)3;
• each instance of R11 is independently halogen, substituted or unsubstituted alkyl, substituted or unsubstituted carbocyclyl, substituted or unsubstituted heterocyclyl, substituted or unsubstituted aryl, substituted or unsubstituted heteroaryl, —CN, —ORb, —SCN, —SRb, —SSRb, —N3, —NO, —N(Rb)2, —NO2, —C(═O)Rb, —C(═O)ORb, —C(═O)SRb, —C(═O)N(Rb)2, —C(═NRb)Rb, —C(═NRb)ORb, —C(═NRb)SRb, —C(═NRb)N(Rb)2, —S(═O)Rb, —S(═O)ORb, —S(═O)SRb, —S(═O)N(Rb)2, —S(═O)2Rb, —S(═O)2ORb, —S(═O)2SRb, —S(═O)2N(Rb)2, —OC(═O)Rb, —OC(═O)ORb, —OC(═O)SRb, —OC(═O)N(Rb)2, —OC(═NRb)Rb, —OC(═NRb)ORb, —OC═NRb)SRb, —OC(═NRb)N(Rb)2, —OS(═O)Rb, —OS(═O)ORb, —OS(═O)SRb, —OS(═O)N(Rb)2, —OS(═O)2Rb, —OS(═O)2ORb, —OS(═O)2SRb, —OS(═O)2N(Rb)2, —ON(Rb)2, —SC(═O)Rb, —SC(═O)ORb, —SC(═O)SRb, —SC(═O)N(Rb)2, —SC(═NRb)Rb, —SC(═NRb)ORb, —SC(═NRb)SRb, —SC(═NRb)N(Rb)z, —NRbC(═O)Rb, —NRbC(═O)ORb, —NRbC(═O)SRb, —NRbC(═O)N(Rb)2, NRbC(═NRb)Rb, —NRbC(═NRb)ORb, —NRbC(═NRb)SRb, —NRbC(═NRb)N(Rb)2, —NRbS(═O)Rb, —NRbS(═O)ORb, —NRbS(═O)SRb, —NRbS(═O)N(Rb)2, —NRbS(═O)2Rb, —NRbS(═O)2ORb, —NRbS(═O)2SRb, —NRbS(═O)2N(Rb)2, —Si(Rb)3, —Si(Rb)2ORb, —Si(Rb)(ORb)2, —Si(ORb)3, —OSi(Rb)3, —OSi(Rb)2ORb, —OSi(Rb)(ORb)2, or —OSi(ORb)3;
• and
• n3 is 0, 1, 2, 3, or 4, n4 is 0, 1, 2, 3, or 4, and at least one of n3 and n4 is 1, 2, 3, or 4;
• provided that no instance of R10 and R11 comprises one or more non-aromatic unsaturated CC bonds,
• a removal solution comprising cysteine and an aqueous base;
• and
• instructions for using the nail polish kit.