Multi-step predictive control system

A plasma processing system comprising:

• a user interface configured to receive a reference signal defining target values for a controlled parameter that is provided to a controlled output within the system;
• at least one sensor to obtain a measure of the controlled parameter that is controlled at the controlled output, wherein the controlled parameter is measured at a first sampling frequency, the first sampling frequency corresponding to one or more clock cycles, each clock cycle having a first clock cycle duration;
• and
• a predictive control section configured to:
• calculate one or more internal control signal values for one or more internal clock cycles of a second clock cycle duration, wherein the second clock cycle duration is less than the first clock cycle duration;
• predict, using an internal model, one or more internal measurements of the controlled parameter for the one or more internal clock cycles, based upon the one or more internal control signal values;
• and
• adjust at least one actuator, based upon one or more control output values, for the one or more clock cycles having the first clock cycle duration, wherein the one or more control output values are based at least in part on the one or more internal control signal values and the one or more predicted internal measurements.