X-ray reflection analysis system applying multiple x-ray beams

Abstract

An X-ray reflection analysis system applying multiple X-ray beams is provided. The X-ray reflection analysis system includes at least one X-ray source device, a diffraction component, at least one sensor, and a processing device. At least one X-ray source device is configured to generate a primary X-ray beam. The diffraction component is configured to split the primary X-ray beam into a plurality of sub X-ray beams in a matrix form. The at least one sensor is configured to receive a plurality of sensing signals respectively generated after a to-be-measured object is irradiated by the sub X-ray beams. The processing device is configured to control the X-ray source device to generate the primary X-ray beam and to analyze the plurality of sensing signals to generate a plurality of analysis results.

Dependencies are inferred from the claim text.